SCHEMBL6829616

SCHEMBL6829616

CC(=O)C1CCC2C3CCC(C3)C12

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5416493 0.82
SCHEMBL17336867 0.80 SLC1A2 (0.47) HSD11B1
SCHEMBL6058684 0.80 SLC1A2 (0.47) HSD11B1
SCHEMBL3270629 0.79
SCHEMBL14607435 0.76 KMT2A (0.34)
SCHEMBL22844317 0.76 GABRP (0.31)
SCHEMBL5418971 0.75
SCHEMBL5414080 0.72
SCHEMBL16337531 0.72 RAB9A (0.32) HSD11B1
SCHEMBL16375429 0.72 RAB9A (0.32) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1445266-A2 Photoresist copolymer Daicel Chemical Industries, Ltd. (JP) 2004-08-11 EP disclosed
US-20030180662-A1 Acid-sensitive compound and resin composition for photoresist DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-09-25 US disclosed
EP-1000924-A1 ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST Daichel Chemical Industries Ltd (JP) 2000-05-17 EP disclosed