SCHEMBL6830205

SCHEMBL6830205

CCC(CC)CC(C(=O)O)C(=O)O.CCOC(=O)C(CCC(C)C)C(=O)OCC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
SLC1A3 P43003 1/20 0.35
SLC1A2 P43004 1/20 0.35
SLC1A1 P43005 1/20 0.35
POLB P06746 1/20 0.34
PIN1 Q13526 1/20 0.33
TSHR P16473 2/20 0.32
MAPK1 P28482 2/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
ALDH1A1 P00352 1/20 0.32
MMP8 P22894 1/20 0.32
HCAR2 Q8TDS4 1/20 0.32
CAPN9 O14815 1/20 0.32
CTSL P07711 2/20 0.31
LMNA P02545 1/20 0.31
CAPN1 P07384 1/20 0.31
CTSB P07858 1/20 0.31
CTSG P08311 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8160913 0.84 TDP1 (0.42) TDP1MEN1KMT2ASLC1A3SLC1A2
SCHEMBL335395 0.84 TDP1 (0.44) TDP1MEN1KMT2APOLBTSHR
Butane SCHEMBL6830203 0.82 SLC1A3 (0.39) TDP1SLC1A3SLC1A2SLC1A1POLB
Ethane SCHEMBL28448159 0.82 TDP1 (0.43) TDP1MEN1KMT2APOLBTSHR
SCHEMBL1010641 0.80 ALDH1A1 (0.42) TDP1MEN1KMT2APOLBPIN1
SCHEMBL1008665 0.75 SLC1A3 (0.41) TDP1SLC1A3SLC1A2SLC1A1MAPK1
SCHEMBL4613905 0.75 TDP1 (0.50) TDP1MEN1KMT2APOLBTSHR
SCHEMBL27868181 0.75 CYP3A4 (0.47) TDP1SLC1A3SLC1A2SLC1A1TSHR
SCHEMBL4142966 0.74 TP53 (0.41) TDP1MEN1KMT2APOLBTSHR
SCHEMBL489304 0.74 MME (0.43) TDP1SLC1A3SLC1A2ALDH1A1MMP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2004076425-A1 IMPROVED SYNTHESIS OF MACROCYCLIC TETRAAMIDO COMPOUNDS AND NEW METAL INSERTION PROCESS CARNEGIE MELLON UNIVERSITY (US) 2004-09-10 WO disclosed