SCHEMBL6830211

SCHEMBL6830211

N#Cc1cc([N+](=O)[O-])cc([N+](=O)[O-])c1N.Nc1ncc(Br)cc1[N+](=O)[O-]

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
XDH P47989 1/20 0.50
ALDH1A1 P00352 2/20 0.46
CYP3A4 P08684 1/20 0.46
LMNA P02545 1/20 0.39
VCAM1 P19320 3/20 0.39
GPR35 Q9HC97 2/20 0.38
HTT P42858 3/20 0.38
GAA P10253 1/20 0.38
RXFP1 Q9HBX9 1/20 0.36
GRM6 O15303 1/20 0.35
GRIA1 P42261 1/20 0.35
GRIA2 P42262 1/20 0.35
GRIA3 P42263 1/20 0.35
GRIA4 P48058 1/20 0.35
GLA P06280 2/20 0.35
TDP1 Q9NUW8 2/20 0.35
POLB P06746 1/20 0.35
MAPT P10636 1/20 0.35
CYP2C9 P11712 1/20 0.35
HPGD P15428 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2954149 0.84 XDH (0.68) XDHALDH1A1CYP3A4LMNAVCAM1
SCHEMBL30270558 0.84 XDH (0.68) XDHALDH1A1CYP3A4LMNAVCAM1
Water SCHEMBL28740590 0.82 KMT2A (0.48) ALDH1A1CYP3A4HTTTDP1POLB
SCHEMBL203876 0.81 KMT2A (0.50) ALDH1A1CYP3A4HTTTDP1POLB
SCHEMBL31353089 0.78 GPR35 (0.52) XDHALDH1A1CYP3A4VCAM1GPR35
SCHEMBL2964049 0.74 XDH (0.77) XDHALDH1A1CYP3A4LMNAVCAM1
SCHEMBL30589097 0.73 XDH (0.66) XDHALDH1A1CYP3A4LMNAVCAM1
SCHEMBL623229 0.73 XDH (0.66) XDHALDH1A1CYP3A4LMNAVCAM1
SCHEMBL1328418 0.73 GPR35 (0.41) ALDH1A1CYP3A4VCAM1GPR35GRM6
SCHEMBL986221 0.73 TDP1 (0.52) ALDH1A1CYP3A4LMNAGPR35HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2004076425-A1 IMPROVED SYNTHESIS OF MACROCYCLIC TETRAAMIDO COMPOUNDS AND NEW METAL INSERTION PROCESS CARNEGIE MELLON UNIVERSITY (US) 2004-09-10 WO disclosed