SCHEMBL6831503

SCHEMBL6831503

CC(S)COC(=O)c1ccccc1C(=O)O

nearest known ligand 0.66

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.66
TSHR P16473 6/20 0.66
CYP3A4 P08684 2/20 0.49
CA2 P00918 1/20 0.49
ALOX15 P16050 1/20 0.48
PRSS1 P07477 1/20 0.47
PRSS2 P07478 1/20 0.47
PRSS3 P35030 1/20 0.47
TDP1 Q9NUW8 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
MAPT P10636 1/20 0.46
HDAC8 Q9BY41 1/20 0.46
TP53 P04637 1/20 0.45
MAPK1 P28482 1/20 0.45
ADRB2 P07550 3/20 0.44
ADRB1 P08588 3/20 0.44
ADRB3 P13945 3/20 0.44
LMNA P02545 1/20 0.44
KDM4E B2RXH2 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29895739 0.95 TSHR (0.72) ALDH1A1TSHRCYP3A4CA2PRSS1
SCHEMBL3076229 0.95 TSHR (0.72) ALDH1A1TSHRCYP3A4CA2PRSS1
SCHEMBL29275477 0.89 ALDH1A1 (0.60) ALDH1A1TSHRCYP3A4CA2ALOX15
Phthalic Acid SCHEMBL27873885 0.88 ALDH1A1 (0.86) ALDH1A1TSHRCYP3A4CA2ALOX15
SCHEMBL29601593 0.88 ALDH1A1 (0.86) ALDH1A1TSHRCYP3A4CA2ALOX15
Phthalic Acid SCHEMBL29007201 0.88 ALDH1A1 (0.86) ALDH1A1TSHRCYP3A4CA2ALOX15
Phthalic Acid SCHEMBL29285130 0.88 ALDH1A1 (0.86) ALDH1A1TSHRCYP3A4CA2ALOX15
Phthalic Acid SCHEMBL19667985 0.88 ALDH1A1 (0.86) ALDH1A1TSHRCYP3A4CA2ALOX15
SCHEMBL226501 0.88 ALDH1A1 (0.86) ALDH1A1TSHRCYP3A4CA2ALOX15
SCHEMBL4597929 0.86 ALDH1A1 (0.66) ALDH1A1TSHRCYP3A4CA2ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230058675-A1 RADICALLY POLYMERIZABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF SHOWA DENKO K.K. (JP) 2023-02-23 US disclosed
CN-111752091-B Application of HABI mixed photoinitiator in UVLED photocuring 常州正洁智造科技有限公司 2022-09-06 CN disclosed
WO-2021132140-A1 RADICALLY POLYMERIZABLE RESIN COMPOSITION AND CURED PRODUCT OF SAME 昭和電工株式会社 2021-07-01 WO disclosed
WO-2021132139-A1 RADICAL-POLYMERIZABLE RESIN COMPOSITION AND CURED OBJECT OBTAINED THEREFROM 昭和電工株式会社 2021-07-01 WO disclosed
CN-111752091-A Application of HABI mixed photoinitiator in UVLED photocuring 常州格林感光新材料有限公司 2020-10-09 CN disclosed
CN-111752100-A Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device 常州强力电子新材料股份有限公司 2020-10-09 CN disclosed
EP-1478668-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION Showa Denko K.K. (JP) 2004-11-24 EP disclosed
WO-2003072614-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO K.K. (JP) 2003-09-04 WO disclosed