SCHEMBL3076229

SCHEMBL3076229

CC(S)COC(=O)c1ccccc1C(=O)OCC(C)S

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.72
ALDH1A1 P00352 6/20 0.72
CYP3A4 P08684 3/20 0.53
CA2 P00918 1/20 0.53
TDP1 Q9NUW8 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
PRSS1 P07477 1/20 0.50
PRSS2 P07478 1/20 0.50
PRSS3 P35030 1/20 0.50
TP53 P04637 2/20 0.49
MAPK1 P28482 1/20 0.49
ADRB2 P07550 3/20 0.48
ADRB1 P08588 3/20 0.48
ADRB3 P13945 3/20 0.48
LMNA P02545 1/20 0.47
NPC1 O15118 1/20 0.47
KDM4E B2RXH2 1/20 0.47
MEN1 O00255 1/20 0.46
MAPT P10636 1/20 0.46
NPY1R P25929 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29895739 1.00 TSHR (0.72) TSHRALDH1A1CYP3A4CA2TDP1
SCHEMBL6831503 0.95 ALDH1A1 (0.66) TSHRALDH1A1CYP3A4CA2TDP1
SCHEMBL29275476 0.85 TSHR (0.68) TSHRALDH1A1CYP3A4CA2TDP1
SCHEMBL8144263 0.84 ALDH1A1 (1.00) TSHRALDH1A1CYP3A4CA2TDP1
SCHEMBL42787 0.84 ALDH1A1 (1.00) TSHRALDH1A1CYP3A4CA2TDP1
SCHEMBL29387332 0.84 ALDH1A1 (1.00) TSHRALDH1A1CYP3A4CA2TDP1
SCHEMBL29275477 0.83 ALDH1A1 (0.60) TSHRALDH1A1CYP3A4CA2TDP1
SCHEMBL31454157 0.83 ALDH1A1 (0.65) TSHRALDH1A1TDP1MAPK1ADRB2
SCHEMBL27345462 0.82 ALDH1A1 (0.96) TSHRALDH1A1CYP3A4CA2TDP1
Ammonia Solution, Strong SCHEMBL28046886 0.82 ALDH1A1 (0.96) TSHRALDH1A1CYP3A4CA2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170343037-A1 Reclosable Adhesive Strip HENKEL AG & CO. KGAA (DE) 2017-11-30 US claimed
EP-3227397-A2 A RECLOSABLE ADHESIVE STRIP Henkel AG & Co. KGaA (DE) 2017-10-11 EP claimed
WO-2016087608-A2 A RECLOSABLE ADHESIVE STRIP HENKEL AG & CO. KGAA (DE) 2016-06-09 WO claimed
US-12637544-B2 UV curable silicone composition and cured product thereof DUROPTIX MATERIALS KABUSHIKI KAISHA (JP) 2026-05-26 US disclosed
US-12378450-B2 Adhesive for endoscope and cured product thereof, and endoscope and method for producing the same FUJIFILM CORPORATION (JP) 2025-08-05 US disclosed
US-20250154361-A1 RECESS FILLING MATERIAL KIT, CURED PRODUCT THEREOF, AND RECESS FILLING METHOD RESONAC CORPORATION (JP) 2025-05-15 US disclosed
EP-4328206-A1 RECESS FILLING MATERIAL KIT, CURED PRODUCT OF SAME, AND RECESS FILLING METHOD Resonac Corporation (JP) 2024-02-28 EP disclosed
US-20230391957-A1 PHOTOCURABLE BLACK SILICONE COMPOSITION AND CURED PRODUCT THEREOF DUROPTIX MATERIALS KABUSHIKI KAISHA (JP) 2023-12-07 US disclosed
EP-3891210-B1 MULTI-COMPONENT SYSTEMS FOR PREPARING FOAMED PRODUCTS ARKEMA FRANCE (FR) 2023-08-23 EP disclosed
WO-2023127794-A1 DENTAL CURABLE COMPOSITION AND DENTAL PROSTHESIS COMPRISING BASE MATERIAL AND RESIN LAYER クラレノリタケデンタル株式会社 2023-07-06 WO disclosed
US-20230203353-A1 ADHESIVE FOR ENDOSCOPE AND CURED PRODUCT THEREOF, AND ENDOSCOPE AND METHOD FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2023-06-29 US disclosed
US-8283095-B2 Thiourethane compound and photosensitive resin composition SHOWA DENKO K.K. (JP) 2012-10-09 US disclosed
US-20100233596-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION SHOWA DENKO K.K. (JP) 2010-09-16 US disclosed
EP-2055726-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Showa Denko K.K. (JP) 2009-05-06 EP disclosed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US disclosed
US-20060079593-A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same SHOWA DENKO K.K. (JP) 2006-04-13 US disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed
EP-1478668-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION Showa Denko K.K. (JP) 2004-11-24 EP disclosed
WO-2003072614-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO K.K. (JP) 2003-09-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12637544-B2 UV curable silicone composition and cured product thereof QSOX1, MGMT, TST TSHR 3875/4885ALDH1A1 70/4885CYP3A4 2021/4885
US-20100233596-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION RCOR3, CBR3, TAS2R3 TSHR 3601/4885ALDH1A1 1341/4885CYP3A4 1036/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.