SCHEMBL6832199

SCHEMBL6832199

C=C(Cc1c2ccccc2cc2ccccc12)C(=O)OCC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.46
NPSR1 Q6W5P4 1/20 0.46
ALDH1A1 P00352 4/20 0.44
MAPT P10636 4/20 0.44
HPGD P15428 2/20 0.41
CDC25B P30305 2/20 0.40
KMT2A Q03164 5/20 0.40
L3MBTL1 Q9Y468 3/20 0.40
MAPK1 P28482 1/20 0.40
MEN1 O00255 2/20 0.40
GAA P10253 2/20 0.40
LMNA P02545 2/20 0.40
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
ATM Q13315 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
GLA P06280 1/20 0.40
CASP1 P29466 1/20 0.39
NR1I2 O75469 1/20 0.39
CYP1A2 P05177 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL559460 0.85 HTR2A (0.41) KDM4ENPSR1ALDH1A1HPGDKMT2A
SCHEMBL6835387 0.79 KMT2A (0.56) KDM4EALDH1A1MAPTHPGDCDC25B
SCHEMBL6837940 0.79 KDM4E (0.48) KDM4ENPSR1ALDH1A1MAPTHPGD
SCHEMBL1497455 0.78 KDM4E (0.48) KDM4EALDH1A1HPGDKMT2AL3MBTL1
SCHEMBL4080472 0.76 HTR2A (0.48) KDM4EALDH1A1MAPTHPGDKMT2A
SCHEMBL28981995 0.76 KDM4E (0.44) KDM4ENPSR1ALDH1A1MAPTHPGD
SCHEMBL27552823 0.75 KDM4E (0.50) KDM4ENPSR1ALDH1A1MAPTHPGD
SCHEMBL6063572 0.75 EDNRA (0.35) KDM4ENPSR1ALDH1A1HPGDL3MBTL1
Anthracene SCHEMBL18662368 0.74 ALDH1A1 (0.51) KDM4ENPSR1ALDH1A1MAPTHPGD
SCHEMBL394740 0.74 ALDH1A1 (0.56) ALDH1A1MAPTKMT2AL3MBTL1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6753125-B2 SUCH AS A 1-NAPHTHALENEMETHYL ACRYLATE COPOLYMER; PHOTORESIST WITH RESISTANCE TO DRY ETCHING; FOR PHOTOLITHOGRAPHY SAMSUNG ELECTRONICS, CO. LTD (KR) 2004-06-22 US disclosed
US-20020076641-A1 Photosensitive polymer having fused aromatic ring and photoresist composition containing the same SAMSUNG ELECTRONICS CO., LTD. 2002-06-20 US disclosed