SCHEMBL6832845

SCHEMBL6832845

CCCc1ccc(C(O)C(=O)c2ccccc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 2/20 0.62
CES1 P23141 2/20 0.62
LMNA P02545 1/20 0.62
KDM4E B2RXH2 1/20 0.50
ALDH1A1 P00352 1/20 0.50
L3MBTL1 Q9Y468 2/20 0.45
PLK1 P53350 1/20 0.44
PGR P06401 1/20 0.42
ADRA2A P08913 1/20 0.42
ADRA2B P18089 1/20 0.42
HTR2A P28223 1/20 0.42
HRH1 P35367 1/20 0.42
KCNH2 Q12809 1/20 0.42
THRB P10828 1/20 0.42
MDM2 Q00987 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
NPC1 O15118 1/20 0.41
POLB P06746 1/20 0.41
RAB9A P51151 1/20 0.41
KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6832844 0.94 LMNA (0.62) CES2CES1LMNAKDM4EALDH1A1
SCHEMBL6838814 0.91 CES2 (0.59) CES2CES1LMNAKDM4EALDH1A1
SCHEMBL6837054 0.89 CES2 (0.57) CES2CES1LMNAALDH1A1HTR2A
SCHEMBL6836853 0.88 CES2 (0.56) CES2CES1LMNAALDH1A1HTR2A
SCHEMBL6832881 0.88 CES2 (0.56) CES2CES1LMNAALDH1A1HTR2A
SCHEMBL6836520 0.88 CES2 (0.56) CES2CES1LMNAALDH1A1HTR2A
SCHEMBL6838582 0.87 LMNA (0.67) CES2CES1LMNAKDM4EALDH1A1
SCHEMBL6838813 0.84 CES2 (0.59) CES2CES1LMNAKDM4EALDH1A1
SCHEMBL6837052 0.83 CES2 (0.57) CES2CES1LMNAKDM4EALDH1A1
SCHEMBL7287508 0.83 CES2 (0.57) CES2CES1LMNAKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0325061-B1 Process for producing poly (para-phenylene-sulfide) TOSOH CORP (JP) 1995-12-06 EP claimed
EP-0564282-A2 Bis-dithiobenzilnickel complexes for usae in near-infrared absorbing materials and benzoin derivatives as intermediates therefor NIPPON PAPER INDUSTRIES CO., LTD. (JP) 1993-10-06 EP claimed
US-5037953-A Dehydrating mixture of alkali metal sulfide, polar aprotic solvent, sodium salt of aromatic acid, reacting with p-dihalobenzene TOSOH CORPORATION (JP) 1991-08-06 US claimed
EP-0325061-A2 Process for producing poly (para-phenylene-sulfide) Tosoh Corporation (JP) 1989-07-26 EP claimed
CN-101151244-B Histamine H3 receptor agents, preparation and therapeutic uses LILLY CO ELI 2014-09-03 CN disclosed
CN-101151244-A Histamine H3 receptor agents, preparation and therapeutic uses LILLY CO ELI (US) 2008-03-26 CN disclosed
US-6756432-B2 POLYBUTADIENE TYPE POLYMER WITH A 1-BENZOPYRAN, A 1-BENZO PYRAN-2-ONE OR A BENZOIN DERIVATIVE; MOLDS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-06-29 US disclosed
US-20030153655-A1 Polybutadiene composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-08-14 US disclosed
EP-0564282-B1 Bis-dithiobenzilnickel complexes for use in near-infrared absorbing materials and benzoin derivatives as intermediates therefor JUJO PAPER CO LTD (JP) 1996-07-03 EP disclosed
US-5484689-A SUBSTRATE WITH OPTICAL RECORDING LAYER AND COLORLESSS DYE NIPPON PAPER INDUSTRIES CO., LTD. (JP) 1996-01-16 US disclosed
EP-0325061-B1 Process for producing poly (para-phenylene-sulfide) TOSOH CORP (JP) 1995-12-06 EP disclosed
EP-0564282-A2 Bis-dithiobenzilnickel complexes for usae in near-infrared absorbing materials and benzoin derivatives as intermediates therefor NIPPON PAPER INDUSTRIES CO., LTD. (JP) 1993-10-06 EP disclosed
US-5037953-A Dehydrating mixture of alkali metal sulfide, polar aprotic solvent, sodium salt of aromatic acid, reacting with p-dihalobenzene TOSOH CORPORATION (JP) 1991-08-06 US disclosed
EP-0325061-A2 Process for producing poly (para-phenylene-sulfide) Tosoh Corporation (JP) 1989-07-26 EP disclosed