SCHEMBL6832906

SCHEMBL6832906

COCCCC(O)CC1CC2C=CC1C2

nearest known ligand 0.35

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.35
ALDH1A1 P00352 1/20 0.35
IDO1 P14902 1/20 0.33
TDO2 P48775 1/20 0.33
POLB P06746 1/20 0.31
ALOX15 P16050 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6836071 0.79 KDM4E (0.32) KDM4EALDH1A1POLBALOX15
SCHEMBL4787578 0.76 KDM4E (0.41) KDM4EALDH1A1POLBALOX15
SCHEMBL1977356 0.76 KDM4E (0.45) KDM4EALDH1A1IDO1TDO2POLB
SCHEMBL15922747 0.76 KDM4E (0.45) KDM4EALDH1A1IDO1TDO2POLB
SCHEMBL13346247 0.74 KDM4E (0.40) KDM4EALDH1A1POLBALOX15
SCHEMBL13346243 0.73 KDM4E (0.39) KDM4EALDH1A1POLBALOX15
SCHEMBL13346246 0.73 KDM4E (0.39) KDM4EALDH1A1POLBALOX15
SCHEMBL13346245 0.73 KDM4E (0.39) KDM4EALDH1A1POLBALOX15
SCHEMBL13346240 0.73 KDM4E (0.39) KDM4EALDH1A1POLBALOX15
SCHEMBL13346242 0.73 KDM4E (0.39) KDM4EALDH1A1POLBALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6784268-B2 POLAR ALKYLOXYALKYL-SUBSTITUTED NORBORN-2-ENES, PENTALENES, 4,7-METHANOINDENES HAVING A ACID LABILE GROUP AS MONOMERS FOR HIGH-MOLECULAR WEIGHT POLYMERS; SUBSTRATE ADHESION; RIGIDITY; RESOLUTION AND ETCH RESISTANE; MICROPATTERNS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-31 US disclosed
US-20040013973-A1 Ether, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO,. LTD. (JP) 2004-01-22 US disclosed
US-6624335-B2 Unsaturated ether compound; photopolymerization SHIN ETSU CHEMICAL CO., LTD. (JP) 2003-09-23 US disclosed
US-20020161150-A1 Ether, polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-10-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020161150-A1 Ether, polymer, resist composition and patterning process ARCN1, RER1, GAR1 KDM4E 132/4885ALDH1A1 1186/4885IDO1 4542/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.