SCHEMBL6833150

SCHEMBL6833150

COc1c(F)c(F)c(N2C(=O)C=CC2=O)c(F)c1F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 11/20 0.41
HSP90AA1 P07900 3/20 0.36
CCR6 P51684 3/20 0.36
TLR9 Q9NR96 2/20 0.36
ALDH1A1 P00352 2/20 0.36
PKM P14618 2/20 0.36
MAPT P10636 1/20 0.36
MAPK1 P28482 1/20 0.36
RAB9A P51151 1/20 0.36
CACNA1B Q00975 1/20 0.36
APBA1 Q02410 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36
G6PD P11413 1/20 0.36
FAAH O00519 2/20 0.33
BCHE P06276 1/20 0.32
HSD17B10 Q99714 1/20 0.32
GSK3A P49840 2/20 0.31
GSK3B P49841 2/20 0.31
MEN1 O00255 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24702072 0.83 MGLL (0.39) MGLLHSP90AA1CCR6TLR9ALDH1A1
SCHEMBL7264420 0.82 MGLL (0.48) MGLLHSP90AA1CCR6TLR9PKM
SCHEMBL718457 0.80 MGLL (0.46) MGLLHSP90AA1CCR6TLR9PKM
SCHEMBL24702075 0.78 MGLL (0.35) MGLLHSP90AA1CCR6TLR9ALDH1A1
SCHEMBL24702073 0.78 MGLL (0.44) MGLLHSP90AA1CCR6TLR9ALDH1A1
SCHEMBL16768814 0.77 MGLL (0.40) MGLLHSP90AA1CCR6TLR9ALDH1A1
SCHEMBL2699797 0.76 MGLL (0.43) MGLLHSP90AA1CCR6TLR9ALDH1A1
SCHEMBL6834882 0.72 MGLL (0.40) MGLLHSP90AA1CCR6TLR9PKM
SCHEMBL24702076 0.71 MGLL (0.39) MGLLHSP90AA1CCR6TLR9ALDH1A1
SCHEMBL3763099 0.69 HSD17B10 (0.41) ALDH1A1MAPTMAPK1HSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6746722-B2 EXPOSING POLYMER AND PHOTOACID GENERATOR WITH A LIGHT OF 180 NM OR LESS WAVELENGTH, AND CONDUCTING BAKING AND DEVELOPMENT. NEC CORPORATION (JP) 2004-06-08 US disclosed
US-20030036618-A1 Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition NEC CORPORATION (JP) 2003-02-20 US disclosed