Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6834859 | 1.00 | LMNA (0.48) | LMNATHRB | |
| SCHEMBL6919586 | 0.83 | — | — | |
| SCHEMBL6919585 | 0.83 | — | — | |
| SCHEMBL6829653 | 0.79 | CES1 (0.31) | — | |
| SCHEMBL6829656 | 0.79 | CES1 (0.31) | — | |
| SCHEMBL22602138 | 0.78 | LMNA (0.55) | LMNATHRB | |
| SCHEMBL15177897 | 0.76 | LMNA (0.46) | LMNATHRB | |
| SCHEMBL721893 | 0.75 | LMNA (0.58) | LMNATHRB | |
| SCHEMBL6834955 | 0.74 | THRB (0.40) | THRB | |
| SCHEMBL6829638 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1748318-A2 | Chemical amplification-type resist composition and production process thereof | Fuji Photo Film Co., Ltd. (JP) | 2007-01-31 | — | — | EP | disclosed |
| US-6746722-B2 | EXPOSING POLYMER AND PHOTOACID GENERATOR WITH A LIGHT OF 180 NM OR LESS WAVELENGTH, AND CONDUCTING BAKING AND DEVELOPMENT. | NEC CORPORATION (JP) | 2004-06-08 | — | — | US | disclosed |
| US-20030036618-A1 | Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition | NEC CORPORATION (JP) | 2003-02-20 | — | — | US | disclosed |