SCHEMBL683579

SCHEMBL683579

CCC(C)c1ccc(OC(C)OCCOc2cccc(C3CCCCC3)c2)cc1

nearest known ligand 0.40

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
PPARG P37231 6/20 0.40
ALDH1A1 P00352 2/20 0.40
PPARD Q03181 1/20 0.39
PPARA Q07869 1/20 0.39
PRMT5 O14744 1/20 0.37
WDR77 Q9BQA1 1/20 0.37
HTR1A P08908 1/20 0.36
SPHK1 Q9NYA1 1/20 0.36
DRD2 P14416 3/20 0.35
DRD3 P35462 1/20 0.35
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL111764 0.88 ALDH1A1 (0.46) ALDH1A1MEN1KMT2ATDP1
SCHEMBL683620 0.87 ALDH1A1 (0.47) ALDH1A1MEN1KMT2ATDP1
SCHEMBL6721650 0.85 HRH3 (0.40) PPARGALDH1A1PPARDPPARA
SCHEMBL12974584 0.84 HTR1A (0.39) PPARGALDH1A1PPARDPPARAHTR1A
SCHEMBL17931689 0.83 HRH3 (0.45) ALDH1A1MEN1KMT2ATDP1
SCHEMBL17147975 0.81 ALDH1A1 (0.40) PPARGALDH1A1PPARAMEN1KMT2A
SCHEMBL683254 0.80 HTR1D (0.46) ALDH1A1PRMT5WDR77HTR1ADRD3
SCHEMBL2758470 0.80 NPSR1 (0.49) ALDH1A1MEN1KMT2ATDP1
SCHEMBL683605 0.79 ALDH1A1 (0.46) ALDH1A1MEN1KMT2ATDP1
SCHEMBL682190 0.79 TSHR (0.44) ALDH1A1MEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed