SCHEMBL6836296

SCHEMBL6836296

CCC(OCc1ccccc1)Oc1ccc(C=CC=Cc2ccc(O)cc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.45
CYP1A1 P04798 1/20 0.45
CYP19A1 P11511 1/20 0.45
ABCG2 Q9UNQ0 1/20 0.43
AKR1B10 O60218 2/20 0.43
AKR1B1 P15121 2/20 0.43
CA12 O43570 1/20 0.43
CA4 P22748 1/20 0.43
CA6 P23280 1/20 0.43
CA5A P35218 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
CA14 Q9ULX7 1/20 0.43
CA5B Q9Y2D0 1/20 0.43
BACE1 P56817 3/20 0.43
GSK3B P49841 2/20 0.43
LMNA P02545 1/20 0.42
PTGS1 P23219 1/20 0.42
SLC6A2 P23975 1/20 0.42
CYP2C19 P33261 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4964002 0.85 APP (0.46) CYP1A1ABCG2CA12CA4CA6
SCHEMBL5145553 0.84 CYP1A2 (0.50) CYP1A2CYP1A1CYP19A1ABCG2AKR1B10
SCHEMBL7263890 0.82 APP (0.48) CYP1A1ABCG2CA12CA7CA9
SCHEMBL6741792 0.81 LMNA (0.37) BACE1GSK3BLMNAPPARGPPARA
Acrylic Acid Methyl Ester SCHEMBL7270941 0.74 CA12 (0.43) ABCG2AKR1B10AKR1B1CA12CA7
SCHEMBL7270957 0.73 STAT3 (0.41) ABCG2CA12CA7CA9CA14
SCHEMBL7263305 0.73 CA12 (0.42) ABCG2CA12CA7CA9CA14
SCHEMBL6387605 0.72 APP (0.38) CYP1A1ABCG2CA12CA7CA9
SCHEMBL3264447 0.72 APP (0.47) CYP1A1ABCG2AKR1B10AKR1B1CA12
Styrene SCHEMBL8521357 0.72 STAT3 (0.38) CYP1A2CYP1A1CYP19A1ABCG2PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6682869-B2 IN POLYMER SHIN-ETU CHEMICAL CO., LTD. (JP) 2004-01-27 US disclosed
US-20010038971-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-11-08 US disclosed