SCHEMBL6836738

SCHEMBL6836738

CCCOc1cc(OCCC)cc(C(N)=O)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLA2G2A P14555 1/20 0.54
KMT2A Q03164 2/20 0.53
ALDH1A1 P00352 2/20 0.53
SMN1; SMN2 Q16637 2/20 0.53
MEN1 O00255 1/20 0.53
TSHR P16473 1/20 0.49
PARP10 Q53GL7 2/20 0.47
L3MBTL1 Q9Y468 1/20 0.46
PLK1 P53350 1/20 0.46
MAPK1 P28482 1/20 0.42
LMNA P02545 1/20 0.42
HTT P42858 1/20 0.42
F2 P00734 1/20 0.42
PRSS1 P07477 1/20 0.42
PRSS2 P07478 1/20 0.42
PRSS3 P35030 1/20 0.42
ST14 Q9Y5Y6 1/20 0.42
PARP1 P09874 1/20 0.42
MAPT P10636 1/20 0.41
HSD17B10 Q99714 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17414620 0.91 PLA2G2A (0.62) PLA2G2ASMN1; SMN2TSHRPARP10
SCHEMBL9071440 0.89 PARP10 (0.50) PLA2G2AKMT2AALDH1A1SMN1; SMN2MEN1
SCHEMBL5086980 0.87 PLA2G2A (0.73) PLA2G2AKMT2AMEN1TSHRLMNA
SCHEMBL11695455 0.87 PLA2G2A (0.73) PLA2G2AKMT2AMEN1TSHRLMNA
SCHEMBL14763514 0.87 PLA2G2A (0.73) PLA2G2AKMT2AMEN1TSHRLMNA
SCHEMBL15977059 0.87 PLA2G2A (0.57) PLA2G2ASMN1; SMN2TSHRPARP10
SCHEMBL5225611 0.87 ALDH1A1 (0.49) PLA2G2AKMT2AALDH1A1SMN1; SMN2MEN1
Hydrochloric Acid SCHEMBL5005668 0.86 PLA2G2A (0.71) PLA2G2AKMT2AMEN1TSHRLMNA
SCHEMBL4262945 0.84 PARP10 (0.66) PLA2G2AKMT2AALDH1A1MEN1TSHR
SCHEMBL23352165 0.82 PLA2G2A (0.77) PLA2G2AKMT2AMEN1TSHRL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040018458-A1 Photothermographic material FUJIFILM CORPORATION (JP) 2004-01-29 US disclosed
US-5223384-A Multilayer; paper support, subbing and photosensitive layer KONICA CORPORATION (JP) 1993-06-29 US disclosed
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed