SCHEMBL6841674

SCHEMBL6841674

C=CCc1ccccc1[SiH](O)O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 2/20 0.47
GABRB2 P47870 2/20 0.47
AKR1B1 P15121 1/20 0.37
ALDH1A1 P00352 2/20 0.36
L3MBTL1 Q9Y468 1/20 0.35
MEN1 O00255 1/20 0.35
MAPT P10636 1/20 0.35
MAPK1 P28482 1/20 0.35
KMT2A Q03164 1/20 0.35
ADRB2 P07550 3/20 0.35
ADRB1 P08588 3/20 0.35
LMNA P02545 2/20 0.35
HTR1A P08908 1/20 0.35
ADRB3 P13945 1/20 0.35
ADRA2C P18825 1/20 0.35
SLC6A2 P23975 1/20 0.35
BDKRB2 P30411 1/20 0.35
SLC6A4 P31645 1/20 0.35
ADRA1A P35348 1/20 0.35
HTR2B P41595 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL125206 0.79 GABRA1 (0.42) GABRA1GABRB2AKR1B1ALDH1A1L3MBTL1
SCHEMBL28730875 0.79 GABRA1 (0.42) GABRA1GABRB2ALDH1A1ADRB2ADRB1
Hydrogen Peroxide SCHEMBL10784213 0.77 GABRA1 (0.58) GABRA1GABRB2AKR1B1ALDH1A1L3MBTL1
Hydrogen Peroxide SCHEMBL7819301 0.77 GABRA1 (0.58) GABRA1GABRB2AKR1B1ALDH1A1L3MBTL1
SCHEMBL29763626 0.77 GABRA1 (0.56) GABRA1GABRB2AKR1B1ALDH1A1L3MBTL1
SCHEMBL173300 0.77 GABRA1 (0.56) GABRA1GABRB2AKR1B1ALDH1A1L3MBTL1
SCHEMBL28730873 0.76 GABRA1 (0.40) GABRA1GABRB2ALDH1A1MAPTADRB2
SCHEMBL3109867 0.75 GABRA1 (0.39) GABRA1GABRB2ALDH1A1ADRB2ADRB1
Phosphine SCHEMBL28908229 0.74 GABRA1 (0.54) GABRA1GABRB2AKR1B1ALDH1A1L3MBTL1
SCHEMBL19437729 0.74 GABRA1 (0.54) GABRA1GABRB2AKR1B1ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0594175-B1 Process for producing aromatic polycarbonate MITSUBISHI CHEM CORP (JP) 1997-06-18 EP claimed
US-5391691-A Melt condensing am aromatic diol compound and a carbonic acid diester in the presence of an interesterification catalyst and co-presence of an organosilicon compound MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1995-02-21 US claimed
EP-0594175-A1 Process for producing aromatic polycarbonate MITSUBISHI CHEMICAL CORPORATION (JP) 1994-04-27 EP claimed
US-6764807-B2 LITHOGRAPHY KODAK POLYCHROME GRAPHICS LLC 2004-07-20 US disclosed
US-20020086235-A1 Lithography EASTMAN KODAK COMPANY 2002-07-04 US disclosed
US-6399271-B1 HYDROXY CONTAINING COMPOUND WITH AFFINITY FOR INK, AND TITANIUM OR SILICON CONTAINING COMPOUND WITH DIFFERENT AFFINITY FOR INK KODAK POLYCHROME GRAPHICS LLC 2002-06-04 US disclosed
EP-1021301-A1 PLANOGRAPHIC PRINTING Kodak Polychrome Graphics Company Ltd. (US) 2000-07-26 EP disclosed
WO-1999014048-A1 PLANOGRAPHIC PRINTING KODAK POLYCHROME GRAPHICS COMPANY LTD (US) 1999-03-25 WO disclosed
EP-0594175-B1 Process for producing aromatic polycarbonate MITSUBISHI CHEM CORP (JP) 1997-06-18 EP disclosed
US-5391691-A Melt condensing am aromatic diol compound and a carbonic acid diester in the presence of an interesterification catalyst and co-presence of an organosilicon compound MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1995-02-21 US disclosed
EP-0594175-A1 Process for producing aromatic polycarbonate MITSUBISHI CHEMICAL CORPORATION (JP) 1994-04-27 EP disclosed
EP-0377175-A2 Pattern forming composition and process for forming pattern using the same HITACHI, LTD. (JP) 1990-07-11 EP disclosed