Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 1/20 | 0.39 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | ADRB2 | P07550 | 3/20 | 0.35 |
| ▸ | ADRB1 | P08588 | 3/20 | 0.35 |
| ▸ | ADRA2C | P18825 | 3/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | HTR1A | P08908 | 2/20 | 0.35 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.35 |
| ▸ | BDKRB2 | P30411 | 1/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | HTR2B | P41595 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3344111 | 0.82 | GABRA1 (0.37) | GABRA1GABRB2ALDH1A1TSHRADRB2 | |
| SCHEMBL545114 | 0.79 | GABRA1 (0.37) | GABRA1GABRB2ALDH1A1TSHRADRB2 | |
| SCHEMBL28730875 | 0.79 | GABRA1 (0.42) | GABRA1GABRB2ALDH1A1TSHRADRB2 | |
| SCHEMBL4274033 | 0.76 | GABRA1 (0.38) | GABRA1GABRB2ALDH1A1TP53CYP2D6 | |
| SCHEMBL28730873 | 0.76 | GABRA1 (0.40) | GABRA1GABRB2ALDH1A1TSHRADRB2 | |
| SCHEMBL1263395 | 0.75 | ALDH1A1 (0.32) | ALDH1A1TSHR | |
| SCHEMBL1262921 | 0.75 | ALDH1A1 (0.34) | ALDH1A1TSHR | |
| SCHEMBL6841674 | 0.75 | GABRA1 (0.47) | GABRA1GABRB2ALDH1A1TSHRADRB2 | |
| SCHEMBL22551425 | 0.75 | IDO1 (0.40) | ALDH1A1 | |
| SCHEMBL4075491 | 0.75 | ALDH1A1 (0.32) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3176216-B1 | HYDROPHILIC MATERIAL COMPRISING SULFONATE COPOLYMER AND AMINO RESIN | MITSUI CHEMICALS INC (JP) | 2019-04-24 | — | — | EP | disclosed |
| US-9976050-B2 | Hydrophilic materials including sulfonate copolymer and amino resin | MITSUI CHEMICALS, INC. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-20170210937-A1 | HYDROPHILIC MATERIALS INCLUDING SULFONATE COPOLYMER AND AMINO RESIN | MITSUI CHEMICALS, INC. (JP) | 2017-07-27 | — | — | US | disclosed |
| EP-3176216-A1 | HYDROPHILIC MATERIAL COMPRISING SULFONATE COPOLYMER AND AMINO RESIN | Mitsui Chemicals, Inc. (JP) | 2017-06-07 | — | — | EP | disclosed |
| US-20160046827-A1 | FILM COMPRISING COPOLYMER OR COMPOSITION | MITSUI CHEMICALS, INC. (JP) | 2016-02-18 | — | — | US | disclosed |
| EP-2985301-A1 | COPOLYMER AND HYDROPHILIC MATERIAL COMPRISING SAME | Mitsui Chemicals, Inc. (JP) | 2016-02-17 | — | — | EP | disclosed |
| EP-2985324-A1 | FILM COMPRISING COPOLYMER OR COMPOSITION | Mitsui Chemicals, Inc. (JP) | 2016-02-17 | — | — | EP | disclosed |
| US-20160032036-A1 | COPOLYMER AND HYDROPHILIC MATERIAL COMPOSED OF THE SAME | MITSUI CHEMICALS, INC. (JP) | 2016-02-04 | — | — | US | disclosed |
| US-9170492-B2 | Silicon-containing film-forming composition, silicon-containing film, and pattern forming method | JSR CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| US-9140985-B2 | — | — | 2015-09-22 | — | — | US | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100233632-A1 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2010-09-16 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| US-20060024980-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2006-02-02 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |