SCHEMBL68440

SCHEMBL68440

C=C(C)C(=O)OCCc1cccc2ccccc12

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CDYL Q9Y232 1/20 0.49
MTNR1A P48039 2/20 0.47
CHRM5 P08912 1/20 0.46
CHRM1 P11229 1/20 0.46
KDM4E B2RXH2 2/20 0.46
TDP1 Q9NUW8 3/20 0.45
ALDH1A1 P00352 1/20 0.44
MCL1 Q07820 1/20 0.43
SIRT5 Q9NXA8 1/20 0.43
ATM Q13315 1/20 0.43
THRB P10828 1/20 0.42
NQO2 P16083 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
FFAR4 Q5NUL3 1/20 0.42
L3MBTL1 Q9Y468 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31467476 1.00 CDYL (0.49) CDYLMTNR1ACHRM5CHRM1KDM4E
Hydrochloric Acid SCHEMBL31467475 0.97 CDYL (0.47) CDYLMTNR1ACHRM5CHRM1KDM4E
SCHEMBL25310380 0.90 CDYL (0.46) CDYLMTNR1AKDM4ETDP1MCL1
SCHEMBL28989701 0.89 TSHR (0.48) CDYLMTNR1AKDM4ETDP1MCL1
SCHEMBL1130685 0.85 KMT2A (0.50) MTNR1ATDP1SIRT5ATMMEN1
SCHEMBL19789891 0.85 CDYL (0.45) CDYLMTNR1ACHRM5CHRM1KDM4E
SCHEMBL6989892 0.84 CDYL (0.53) CDYLMTNR1ACHRM5CHRM1KDM4E
SCHEMBL14001879 0.84 THRB (0.41) CDYLCHRM5CHRM1KDM4ETDP1
SCHEMBL10040373 0.84 THRB (0.41) CDYLCHRM5CHRM1TDP1THRB
SCHEMBL28038015 0.83 KDM4E (0.38) CDYLMTNR1ACHRM5CHRM1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250243389-A1 COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP E INK CORPORATION 2025-07-31 US claimed
CN-119899310-A Acrylate polymer, ultraviolet-curable adhesive composition and polarizer 恒美光电股份有限公司 2025-04-29 CN claimed
CN-117858592-A Efficient and stable perovskite thin film, solar cell device and preparation method 西安天交新能源有限公司 2024-04-09 CN claimed
CN-100429247-C Low water content high refractive index, flexible, polymeric compositions BAUSCH & LOMB (US) 2008-10-29 CN claimed
WO-2007110387-A1 PHOTO-CURABLE RESINS AND RESIN COMPOSITIONS WITH VERY HIGH REFRACTIVE INDICES FOR APPLICATION IN PLASIC OPTICS SEEREAL TECHNOLOGIES S.A. (DE) 2007-10-04 WO claimed
EP-1840652-A1 Photo-curable resins and resin compositions with very high refractive indices for application in plastic optics SeeReal Technologies S.A. (LU) 2007-10-03 EP claimed
CN-1310927-C High refractive index polymeric siloxysilane compositions BAUSCH & LOMB (US) 2007-04-18 CN claimed
CN-1662568-A Low water content high refractive index, flexible, polymeric compositions BAUSCH & LOMB (US) 2005-08-31 CN claimed
CN-1612885-A High refractive index polysiloxysilane compositions BAUSCH & LOMB (US) 2005-05-04 CN claimed
CN-1582289-A High refractive index aromatic-based silyl monomers BAUSCH & LOMB (US) 2005-02-16 CN claimed
CN-1582291-A Arylsiloxane bifunctional macromonomers having a high refractive index BAUSCH & LOMB (US) 2005-02-16 CN claimed
CN-1582290-A Arylsiloxane bifunctional macromonomers having a high refractive index BAUSCH & LOMB (US) 2005-02-16 CN claimed
CN-1582292-A High refractive index polymeric siloxysilane compositions BAUSCH & LOMB (US) 2005-02-16 CN claimed
EP-0808855-B1 Fluorescent polymers and coating compositions ROHM & HAAS (US) 2002-07-17 EP claimed
EP-0808855-A2 Fluorescent polymers and coating compositions ROHM AND HAAS COMPANY (US) 1997-11-26 EP claimed
US-20250243389-A1 COMPOSITION COMPRISING ADDITIVE HAVING A POLYCYCLIC AROMATIC GROUP E INK CORPORATION 2025-07-31 US disclosed
CN-119899310-A Acrylate polymer, ultraviolet-curable adhesive composition and polarizer 恒美光电股份有限公司 2025-04-29 CN disclosed
EP-0808855-A2 Fluorescent polymers and coating compositions ROHM AND HAAS COMPANY (US) 1997-11-26 EP disclosed
EP-0017032-B1 METHOD OF PRODUCING A SOLID STATE DEVICE BY DIFFERENTIAL PLASMA ETCHING OF RESISTS Western Electric Company, Incorporated (US) 1984-02-15 EP disclosed
US-4232110-A FORMATION OF NEGATIVES BELL TELEPHONE LABORATORIES, INCORPORATED (US) 1980-11-04 US disclosed