SCHEMBL6851795

SCHEMBL6851795

CO[Si](CCCC(F)(F)C(F)(F)C(F)(F)F)(OC)OC

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6858982 0.92 LMNA (0.32) LMNA
SCHEMBL6656300 0.92 LMNA (0.35) LMNA
SCHEMBL2548006 0.92 LMNA (0.32) LMNA
SCHEMBL6654167 0.92 LMNA (0.32) LMNA
SCHEMBL29394765 0.92 LMNA (0.32) LMNA
SCHEMBL24841834 0.92 LMNA (0.35) LMNA
SCHEMBL7043872 0.92 LMNA (0.32) LMNA
SCHEMBL9789231 0.92 LMNA (0.35) LMNA
SCHEMBL3740304 0.89
SCHEMBL30193572 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100086878-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-08 US disclosed
US-6835322-B2 Snow slipping-off property upon temperature rise HOKKAIDO (JP) 2004-12-28 US disclosed
US-20030164469-A1 Composition for member preventing accretion of snow or ice and member preventing accretion of snow or ice using the same HOKKAIDO (JP) 2003-09-04 US disclosed
EP-1260567-A1 COMPOSITION FOR MEMBER PREVENTING ACCRETION OF SNOW OR ICE AND MEMBER PREVENTING ACCRETION OF SNOW OR ICE USING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2002-11-27 EP disclosed