Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6536762 | 0.88 | — | — | |
| SCHEMBL18973585 | 0.88 | HSD11B1 (0.35) | HSD11B1EPHX1 | |
| SCHEMBL14593964 | 0.84 | CYP2C9 (0.31) | CYP2C9HSD11B1 | |
| SCHEMBL333419 | 0.82 | HSD11B1 (0.46) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL19919330 | 0.81 | — | — | |
| SCHEMBL1592363 | 0.80 | TSHR (0.33) | HSD11B1EPHX1 | |
| SCHEMBL8103089 | 0.79 | CYP2C9 (0.37) | CYP2C9HSD11B1EPHX1 | |
| SCHEMBL1224877 | 0.78 | CYP2C9 (0.32) | CYP2C9HSD11B1 | |
| Acrylic Acid SCHEMBL5147956 | 0.77 | CYP2C9 (0.41) | CYP2C9HSD11B1 | |
| SCHEMBL19223257 | 0.75 | HSD11B1 (0.37) | CYP2C9HSD11B1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1964893-B2 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2021-11-24 | — | — | EP | disclosed |
| EP-1964893-B1 | Ink composition, inkjet recording method, printed material, and ink set | FUJIFILM CORP (JP) | 2018-01-24 | — | — | EP | disclosed |
| US-8932687-B2 | Process for producing molded printed material, and molded printed material | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8932687-B2 | Process for producing molded printed material, and molded printed material | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| EP-1975213-B1 | Ink composition, injet recording method, printed material, and process for producing lithographic printing plate | FUJIFILM CORP (JP) | 2013-03-27 | — | — | EP | disclosed |
| US-8344045-B2 | Ink composition, inkjet recording method, printed material, and process for producing molded printed material | FUJIFILM CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8344045-B2 | Ink composition, inkjet recording method, printed material, and process for producing molded printed material | FUJIFILM CORPORATION (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8232330-B2 | Nonaqueous ink, image-recording method, image-recording apparatus and recorded article | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-8232330-B2 | Nonaqueous ink, image-recording method, image-recording apparatus and recorded article | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-8211508-B2 | radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; cyclic monofunctional acrylic or N-vinyl monomers | FUJIFILM CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20080008966-A1 | Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate | FUJIFILM CORPORATION (JP) | 2008-01-10 | — | — | US | disclosed |
| US-6794112-B2 | COMPRISES ALKALI SOLUBLE POLYMER (POLYVINYLPHENOL), PHOTOACID GENERATOR (TRIPHENYL SULFONIUM TRIFLUOROMETHANESULFONATE), AND ADAMANTYL ALCOHOL CAPABLE OF DEHYDRATION BONDING WITH POLYMER; ANTISWELLING; IMPROVED RESOLUTION | FUJITSU LIMITED (JP) | 2004-09-21 | — | — | US | disclosed |
| US-6794113-B2 | COMPRISES ALKALI-SOLUBLE POLYMER (POLYVINYLPHENOL), PHOTOACID GENERATOR (TRIPHENYL SULFONIUM TRIFLUOROMETHANESULFONIC ACID), AND ADAMANTYL ALCOHOL CAPABLE OF DEHYDRATION BONDING WITH POLYMER; ANTISWELLING; IMPROVED RESOLUTION | FUJITSU LIMITED (JP) | 2004-09-21 | — | — | US | disclosed |
| US-6787288-B2 | COMPRISES ALKALI SOLUBLE POLYMER (POLYVINYLPHENOL), PHOTOACID GENERATOR (TRIPHENYL SULFONIUM TRIFLUOROMETHANSULFONATE), AND ADAMANTYL ALCOHOL CAPABLE OF DEHYDRATION BONDING WITH POLYMER; ANTISWELLING; IMPROVED RESOLUTION | FUJITSU LIMITED (JP) | 2004-09-07 | — | — | US | disclosed |
| US-6773867-B2 | COATING A NEGATIVE RESIST ONTO A TARGET SUBSTRATE, SELECTIVELY EXPOSING FORMED RESIST FILM TO IMAGE-FORMING RADIATION THAT CAN INDUCE DECOMPOSITION OF PHOTO ACID GENERATOR OF RESIST; DEVELOPING EXPOSED RESIST FILM WITH A BASIC AQUEOUS SOLUTION | FUJITSU LIMITED (JP) | 2004-08-10 | — | — | US | disclosed |
| US-20030143482-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-31 | — | — | US | disclosed |
| US-20030138724-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030138725-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-24 | — | — | US | disclosed |
| US-20030138726-A1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | FUJITSU LIMITED (JP) | 2003-07-24 | — | — | US | disclosed |
| US-6506534-B1 | A negative resist composition developable with basic solutions and being itself soluble in basic aqueous solutions but, upon exposure to said image-forming radiation, being rendered insoluble in basic aqueous solutions at its exposed sections | FUJITSU LIMITED (JP) | 2003-01-14 | — | — | US | disclosed |