Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GBA2 | Q9HCG7 | 17/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | GBA1 | P04062 | 6/20 | 0.33 |
| ▸ | UGCG | Q16739 | 5/20 | 0.32 |
| ▸ | MGAM | O43451 | 2/20 | 0.32 |
| ▸ | GAA | P10253 | 2/20 | 0.32 |
| ▸ | SI | P14410 | 2/20 | 0.32 |
| ▸ | AGL | P35573 | 2/20 | 0.32 |
| ▸ | LCT | P09848 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17899106 | 0.88 | GBA2 (0.37) | GBA2HSD11B1GBA1UGCGMGAM | |
| SCHEMBL17404447 | 0.85 | CA12 (0.38) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL685930 | 0.84 | HSD11B1 (0.32) | HSD11B1 | |
| SCHEMBL686224 | 0.80 | GBA2 (0.35) | GBA2HSD11B1GBA1UGCGMGAM | |
| SCHEMBL16543423 | 0.80 | GBA2 (0.38) | GBA2GBA1UGCGMGAMGAA | |
| SCHEMBL13556149 | 0.80 | ALDH1A1 (0.38) | HSD11B1 | |
| SCHEMBL16543420 | 0.79 | ALDH1A1 (0.32) | GBA2HSD11B1 | |
| SCHEMBL12854592 | 0.78 | GBA2 (0.32) | GBA2GBA1 | |
| SCHEMBL685934 | 0.78 | ALDH1A1 (0.31) | — | |
| SCHEMBL13556154 | 0.77 | GBA2 (0.36) | GBA2HSD11B1GBA1UGCGMGAM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20150301451-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-22 | — | — | US | disclosed |
| US-8574811-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8546059-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-01 | — | — | US | disclosed |
| US-8530135-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8318403-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-27 | — | — | US | disclosed |
| US-20120070778-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120052443-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110123926-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, H1-0, H1-2 | GBA2 2350/4885HSD11B1 1105/4885GBA1 1818/4885 |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, C1S, C9 | GBA2 2084/4885HSD11B1 1135/4885GBA1 1883/4885 |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | RCOR1, C1R, C1S | GBA2 4348/4885HSD11B1 1324/4885GBA1 3920/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.