SCHEMBL6854174

SCHEMBL6854174

C=C(C)C(=O)OC1(CC[Si](C)(C)C)CCCC1

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.34
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21332849 0.88 ALDH1A1 (0.38) ALDH1A1TSHR
SCHEMBL22772600 0.86 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL21338913 0.86 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL21332436 0.86 ALDH1A1 (0.37) ALDH1A1TSHR
SCHEMBL13171870 0.83 ALDH1A1 (0.34) ALDH1A1TSHR
SCHEMBL6855938 0.83 ALDH1A1 (0.36) ALDH1A1TSHR
SCHEMBL328596 0.83 TSHR (0.37) ALDH1A1TSHR
SCHEMBL12520852 0.81 TSHR (0.36) ALDH1A1TSHR
SCHEMBL1397278 0.81 TSHR (0.36) ALDH1A1TSHR
SCHEMBL6854370 0.81 ALDH1A1 (0.35) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6780563-B2 SENSITIVITY AND RESOLUTION, RESISTANCE TO OXYGEN PLASMA ETCHING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-08-24 US disclosed
US-20020061465-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-05-23 US disclosed