⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3250199 | 0.87 | — | — | |
| SCHEMBL7647327 | 0.87 | — | — | |
| SCHEMBL578896 | 0.75 | — | — | |
| SCHEMBL578504 | 0.75 | — | — | |
| SCHEMBL3938862 | 0.75 | — | — | |
| SCHEMBL5441249 | 0.75 | — | — | |
| SCHEMBL1170318 | 0.75 | — | — | |
| SCHEMBL2524722 | 0.75 | — | — | |
| SCHEMBL19119279 | 0.75 | — | — | |
| SCHEMBL1097600 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6784508-B2 | Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-08-31 | — | — | US | disclosed |
| US-20010023120-A1 | Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof | MICROSOFT TECHNOLOGY LICENSING, LLC | 2001-09-20 | — | — | US | disclosed |