Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685731 | 1.00 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL686090 | 1.00 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL47304 | 0.98 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL674145 | 0.90 | TSHR (0.41) | TSHRALDH1A1 | |
| SCHEMBL17247248 | 0.85 | TSHR (0.40) | TSHRALDH1A1 | |
| SCHEMBL4406132 | 0.83 | TSHR (0.37) | TSHRALDH1A1 | |
| SCHEMBL17247223 | 0.82 | TSHR (0.41) | TSHRALDH1A1 | |
| SCHEMBL13172057 | 0.81 | TSHR (0.38) | TSHRALDH1A1 | |
| SCHEMBL7665648 | 0.81 | TSHR (0.34) | TSHRALDH1A1 | |
| SCHEMBL4399277 | 0.81 | TSHR (0.38) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106980235-A | Chemically amplified photoresist composition and process for its use and its application method | 国际商业机器公司 | 2017-07-25 | — | — | CN | claimed |
| CN-102472971-B | chemically amplified photoresist composition and method of use thereof | 国际商业机器公司 | 2016-12-07 | — | — | CN | claimed |
| CN-110462516-A | Positive photoresist composition, pattern produced therefrom and method for producing pattern | LG CHEMICAL LTD | 2019-11-15 | — | — | CN | disclosed |
| CN-105531260-B | Oxime ester photoinitiator | 巴斯夫欧洲公司 | 2019-05-31 | — | — | CN | disclosed |
| CN-106980235-A | Chemically amplified photoresist composition and process for its use and its application method | 国际商业机器公司 | 2017-07-25 | — | — | CN | disclosed |
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| CN-102472971-B | chemically amplified photoresist composition and method of use thereof | 国际商业机器公司 | 2016-12-07 | — | — | CN | disclosed |
| US-9229323-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9229323-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120028188-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120028188-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-7476492-B2 | Low activation energy photoresist composition and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-01-13 | — | — | US | disclosed |
| US-20070275324-A1 | Low activation energy photoresist composition and process for its use | GLOBALFOUNDRIES U.S. INC. | 2007-11-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, C1S, C9 | TSHR 2013/4885ALDH1A1 2064/4885 |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | RCOR1, C1R, C1S | TSHR 3451/4885ALDH1A1 1376/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.