Nitric Acid

Nitric Acid

SCHEMBL6859786

C=CCO[N+](=O)[O-].O=[N+]([O-])O

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ERG11

The experimentally established mechanism targets of Nitric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA5A P35218 1/20 0.40
CA5B Q9Y2D0 1/20 0.40
ALDH1A1 P00352 1/20 0.39
CPA1 P15085 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL170638 0.92
Hydroxyamine SCHEMBL7160353 0.90
SCHEMBL2489865 0.90
Methane SCHEMBL27943234 0.90
Charcoal, Activated SCHEMBL4900853 0.90
Ammonia Solution, Strong SCHEMBL88330 0.90
Hydrazine SCHEMBL726258 0.87
Nitrous Acid SCHEMBL16814068 0.86 ALDH1A1 (0.36) ALDH1A1CPA1
SCHEMBL9233393 0.85 ALDH1A1 (0.39) ALDH1A1
Guanidine SCHEMBL7570333 0.84 ALDH1A1 (0.34) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6743562-B2 ACID GENERATORS; FOR THE PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS, PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 2004-06-01 US disclosed
US-20020172886-A1 Positive photoresist composition FUJI PHOTO FILM CO., LTD. 2002-11-21 US disclosed