⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL170638 | 0.97 | — | — | |
| Methane SCHEMBL27943234 | 0.94 | — | — | |
| Charcoal, Activated SCHEMBL4900853 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL88330 | 0.94 | — | — | |
| Hydrazine SCHEMBL726258 | 0.92 | — | — | |
| Hydroxyamine SCHEMBL7160353 | 0.90 | — | — | |
| SCHEMBL9233393 | 0.90 | ALDH1A1 (0.39) | — | |
| Nitric Acid SCHEMBL6859786 | 0.90 | CA5A (0.40) | — | |
| Trimethylammonium SCHEMBL7112774 | 0.87 | ALDH1A1 (0.37) | — | |
| Nitrous Acid SCHEMBL16814068 | 0.85 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10283230-B2 | Production method for coating liquid for formation of transparent conductive film | SUMITOMO METAL MINING CO., LTD. (JP) | 2019-05-07 | — | — | US | disclosed |
| US-9701849-B2 | Method of manufacturing transparent conductive film, the transparent conductive film, element and transparent conductive substrate using the film, as well as device using the substrate | SUMITOMO METAL MINING CO., LTD. (JP) | 2017-07-11 | — | — | US | disclosed |
| US-20150232674-A1 | PRODUCTION METHOD FOR COATING LIQUID FOR FORMATION OF TRANSPARENT CONDUCTIVE FILM | SUMITOMO METAL MINING CO., LTD. (JP) | 2015-08-20 | — | — | US | disclosed |
| US-9040119-B2 | Method for producing transparent conductive film, transparent conductive film, transparent conductive substrate and device comprising the same | SUMITOMO METAL MINING CO., LTD. (JP) | 2015-05-26 | — | — | US | disclosed |
| US-8963146-B2 | Method of manufacturing transparent conductive film, the transparent conductive substrate using the film, as well as device using the substrate | SUMITOMO METAL MINING CO., LTD. (JP) | 2015-02-24 | — | — | US | disclosed |
| US-8753987-B2 | Method of manufacturing metal oxide film | SUMITOMO METAL MINING CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130101867-A1 | METHOD OF MANUFACTURING METAL OXIDE FILM, METAL OXIDE FILM, ELEMENT USING THE METAL OXIDE FILM, SUBSTRATE WITH METAL OXIDE FILM, AND DEVICE USING THE SUBSTRATE WITH METAL OXIDE FILM | SUMITOMO METAL MINING CO., LTD. (JP) | 2013-04-25 | — | — | US | disclosed |
| US-20120313055-A1 | METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM, THE TRANSPARENT CONDUCTIVE FILM, ELEMENT AND TRANSPARENT CONDUCTIVE SUBSTRATE USING THE FILM, AS WELL AS DEVICE USING THE SUBSTRATE | SUMITOMO METAL MINING CO.LTD. (JP) | 2012-12-13 | — | — | US | disclosed |
| US-20120223302-A1 | METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM, THE TRANSPARENT CONDUCTIVE SUBSTRATE USING THE FILM, AS WELL AS DEVICE USING THE SUBSTRATE | SUMITOMO METAL MINING CO., LTD. (JP) | 2012-09-06 | — | — | US | disclosed |
| US-20110229737-A1 | METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE SUBSTRATE AND DEVICE COMPRISING THE SAME | SUMITOMO METAL MINING CO., LTD. (JP) | 2011-09-22 | — | — | US | disclosed |
| US-5457218-A | Precursor and related method of forming for use in forming electrochromic coatings | DONNELLY CORPORATION (US) | 1995-10-10 | — | — | US | disclosed |
| US-5252354-A | Method for depositing electrochromic layers | DONNELLY CORPORATION (US) | 1993-10-12 | — | — | US | disclosed |
| US-4959247-A | Electrochromic coating and method for making same | DONNELLY CORPORATION (US) | 1990-09-25 | — | — | US | disclosed |
| US-4420500-A | Composition and process for preparing transparent conducting film | HITACHI, LTD. (JP) | 1983-12-13 | — | — | US | disclosed |