SCHEMBL6861206

SCHEMBL6861206

CO[Si](C)(C)OC.CO[Si](OC)(c1ccccc1)c1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
CA4 P22748 2/20 0.35
POLB P06746 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
NR1H2 P55055 1/20 0.31
NR1H3 Q13133 1/20 0.31
LTA4H P09960 1/20 0.30
ALDH1A1 P00352 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27596877 0.90 CA4 (0.41) ESR1ESR2CA4POLBCA12
SCHEMBL49008 0.90 CA4 (0.41) ESR1ESR2CA4POLBCA12
SCHEMBL28085512 0.88 ESR1 (0.38) ESR1ESR2CA4POLBCA12
SCHEMBL11588483 0.87 CA1 (0.41) ESR1ESR2CA4POLBCA12
SCHEMBL27743669 0.87 CA4 (0.39) ESR1ESR2CA4POLBCA12
SCHEMBL706592 0.87 ESR1 (0.41) ESR1ESR2CA4POLBCA12
SCHEMBL18294573 0.86 ESR1 (0.34) ESR1ESR2CA4
SCHEMBL27346093 0.86 ESR1 (0.37) ESR1ESR2CA4POLBCA12
SCHEMBL5410043 0.84 ESR1 (0.40) ESR1ESR2CA4POLBNR1H2
SCHEMBL10835198 0.84 ESR1 (0.35) ESR1ESR2CA4POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140113230-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM ROHM & HAAS ELECT MAT (KR) 2014-04-24 US disclosed
US-6797453-B2 WHICH HAS RESOLUTION HIGH ENOUGH TO FORM THROUGH HOLE OR U-SHAPED DEPRESSION; COMPRISES SILANE COUPLING AGENT; FOR ELECTROLUMINESCENT LIQUID CRYSTAL DISPLAYS JSR CORPORATION (JP) 2004-09-28 US disclosed
US-20030215737-A1 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR CORPORATION (JP) 2003-11-20 US disclosed
EP-1331518-A2 Radiation sensitive composition for forming an insulating film, insulating film and display device JSR Corporation (JP) 2003-07-30 EP disclosed
US-6242046-B1 BLEND OF POLYMER, METAL OXIDE, SOLVENT AND WATER BASF NOF COATINGS COMPANY, LIMITED (JP) 2001-06-05 US disclosed