Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA7 | P43166 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.33 |
| ▸ | NR1H3 | Q13133 | 2/20 | 0.33 |
| ▸ | LTA4H | P09960 | 2/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 4/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27596877 | 0.97 | CA4 (0.41) | ESR1ESR2CA4CA12CA1 | |
| SCHEMBL49008 | 0.97 | CA4 (0.41) | ESR1ESR2CA4CA12CA1 | |
| SCHEMBL11588483 | 0.94 | CA1 (0.41) | ESR1ESR2CA4CA12CA1 | |
| SCHEMBL27743669 | 0.94 | CA4 (0.39) | ESR1ESR2CA4CA12CA1 | |
| SCHEMBL5419766 | 0.93 | ESR1 (0.37) | ESR1ESR2CA4CA12CA1 | |
| SCHEMBL23000913 | 0.91 | ALDH1A1 (0.41) | ESR1ESR2ALDH1A1CYP1A2TSHR | |
| SCHEMBL5410043 | 0.91 | ESR1 (0.40) | ESR1ESR2CA4POLBNR1H2 | |
| SCHEMBL3481943 | 0.91 | ACHE (0.43) | ESR1ESR2CA4POLBALDH1A1 | |
| SCHEMBL5416836 | 0.91 | ESR1 (0.35) | ESR1ESR2CA4POLB | |
| SCHEMBL28085512 | 0.90 | ESR1 (0.38) | ESR1ESR2CA4CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4408906-B1 | METHOD FOR PREPARING LOW-SILANOL POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2025-05-28 | — | — | EP | disclosed |
| EP-4384392-B1 | METAL-PLATED LAMINATES CONTAINING POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2025-03-19 | — | — | EP | disclosed |
| US-20240392072-A1 | METHOD FOR PREPARING LOW-SILANOL POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2024-11-28 | — | — | US | disclosed |
| US-20240336743-A1 | METAL-PLATED LAMINATES CONTAINING POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2024-10-10 | — | — | US | disclosed |
| EP-4408906-A1 | METHOD FOR PREPARING LOW-SILANOL POLYORGANOSILOXANES | Wacker Chemie AG (DE) | 2024-08-07 | — | — | EP | disclosed |
| EP-4384392-A1 | METAL-PLATED LAMINATES CONTAINING POLYORGANOSILOXANES | Wacker Chemie AG (DE) | 2024-06-19 | — | — | EP | disclosed |
| CN-117651641-A | Metal-plated laminates containing polyorganosiloxanes | 瓦克化学股份公司 | 2024-03-05 | — | — | CN | disclosed |
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| WO-2023051912-A1 | METHOD FOR PREPARING LOW-SILANOL POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2023-04-06 | — | — | WO | disclosed |
| WO-2023016649-A1 | METAL-PLATED LAMINATES CONTAINING POLYORGANOSILOXANES | WACKER CHEMIE AG (DE) | 2023-02-16 | — | — | WO | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |