Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 10/20 | 0.45 |
| ▸ | ESR2 | Q92731 | 8/20 | 0.45 |
| ▸ | AR | P10275 | 3/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | G6PD | P11413 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31650660 | 1.00 | TP53 (0.50) | TP53TDP1PDE10AESR1ESR2 | |
| SCHEMBL685679 | 0.82 | TSHR (0.46) | TP53TDP1KDM4EALDH1A1CYP1A2 | |
| SCHEMBL27554682 | 0.81 | TP53 (0.54) | TP53TDP1PDE10AESR1ESR2 | |
| SCHEMBL7909292 | 0.81 | CA12 (0.50) | TDP1KDM4EALDH1A1MAPTHPGD | |
| SCHEMBL1363337 | 0.81 | PRSS1 (0.52) | TP53TDP1ALDH1A1MAPTHPGD | |
| SCHEMBL31484336 | 0.81 | PRSS1 (0.52) | TP53TDP1ALDH1A1MAPTHPGD | |
| SCHEMBL19409856 | 0.80 | TP53 (0.48) | TP53TDP1PDE10AESR1ESR2 | |
| SCHEMBL13212542 | 0.79 | TDP1 (0.43) | TP53TDP1PDE10AESR1ESR2 | |
| SCHEMBL14106373 | 0.79 | CNR2 (0.39) | KDM4EALDH1A1CYP1A2CYP3A4CYP2D6 | |
| SCHEMBL1819662 | 0.79 | SORT1 (0.38) | TDP1ESR1ALDH1A1MAPTGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 441 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118295211-A | Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board | 深圳市容大感光科技股份有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-117850163-A | Positive photosensitive resin composition, method for forming pattern by photoresist, and printed circuit board | 深圳市容大感光科技股份有限公司 | 2024-04-09 | — | — | CN | claimed |
| EP-1928819-B1 | A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHOQUINONESULFONYL ESTER | COUNCIL SCIENT IND RES (IN) | 2011-04-06 | — | — | EP | claimed |
| US-7041732-B2 | Compatible blend of polycarbonate with vinyl (co)polymer | BAYER MATERIALSCIENCE LLC (US) | 2006-05-09 | — | — | US | claimed |
| EP-1153981-B1 | A compatible blend of polycarbonate with vinyl (co)polymer | BAYER AG (US) | 2005-06-15 | — | — | EP | claimed |
| US-20040116624-A1 | Compatible blend of polycarbonate with vinyl (co)polymer | COVESTRO LLC | 2004-06-17 | — | — | US | claimed |
| US-6670420-B2 | A graft thermoplastic molding material comprising a copolymers of polycarbonate and an additional polymer with a hydroxy-containing compatibilizer; finely dispersed phase and resistance to phase separation | BAYER CORPORATION | 2003-12-30 | — | — | US | claimed |
| US-20020183447-A1 | Compatible blend of polycarbonate with vinyl (co)polymer | COVESTRO LLC | 2002-12-05 | — | — | US | claimed |
| US-6465150-B1 | COMPRISING AN AROMATIC SULFONIC ACID ONIUM SALT COMPOUND ACID GENERATOR, FOR EXAMPLE, 2,4-DIFLUOROBENZENESULFONIC ACID ANION AND AN ONIUM CATION OF SULFUR OR IODONIUM, AND A COPOLYMER REPRESENTED BY 4-HYDROXYSTYRENE/4-T-BUTOXYSTYRENE COPOLYMER | JSR CORPORATION (JP) | 2002-10-15 | — | — | US | claimed |
| EP-1153981-A2 | A compatible blend of polycarbonate with vinyl (co)polymer | Bayer Corporation (US) | 2001-11-14 | — | — | EP | claimed |
| US-4039630-A | Elastomer | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-08-02 | — | — | US | claimed |
| WO-2025132182-A2 | POST-EXPOSURE BAKE LESS CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2025-06-26 | — | — | WO | disclosed |
| US-20250011507-A1 | POLYCYCLIC AROMATIC HYDROCARBON PHOTOCURABLE RESIN COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-01-09 | — | — | US | disclosed |
| CN-115524923-B | Negative photosensitive resin composition, patterning method and application thereof | 深圳市容大感光科技股份有限公司 | 2024-11-19 | — | — | CN | disclosed |
| EP-4435517-A1 | POLYCYCLIC AROMATIC HYDROCARBON-BASED PHOTO-CURABLE RESIN COMPOSITION | Nissan Chemical Corporation (JP) | 2024-09-25 | — | — | EP | disclosed |
| US-4233431-A | HEAT AND CHEMICAL RESISTANT STABILIZERS-POLYCARBONATE | BAYER AKTIENGESELLSCHAFT (DE) | 1980-11-11 | — | — | US | disclosed |
| US-4142035-A | Polycondensates containing hydroxyquinoline end groups, their use for the preparation of polymers containing metals and metal containing polycondensates | BAYER AKTIENGESELLSCHAFT (DE) | 1979-02-27 | — | — | US | disclosed |
| US-4137219-A | STABILIZERS | BAYER AKTIENGESELLSCHAFT (DE) | 1979-01-30 | — | — | US | disclosed |
| US-4045499-A | ACID CATALYSTS | BAYER AKTIENGESELLSCHAFT (DT) | 1977-08-30 | — | — | US | disclosed |
| US-4039630-A | Elastomer | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-08-02 | — | — | US | disclosed |