Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 4/20 | 0.50 |
| ▸ | CA1 | P00915 | 4/20 | 0.50 |
| ▸ | CA2 | P00918 | 4/20 | 0.50 |
| ▸ | CA7 | P43166 | 4/20 | 0.50 |
| ▸ | CA9 | Q16790 | 4/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | GAA | P10253 | 2/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | CA4 | P22748 | 1/20 | 0.50 |
| ▸ | CA6 | P23280 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | DBH | P09172 | 1/20 | 0.48 |
| ▸ | RECQL | P46063 | 1/20 | 0.48 |
| ▸ | XDH | P47989 | 1/20 | 0.48 |
| ▸ | EGFR | P00533 | 1/20 | 0.47 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.45 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14106373 | 0.83 | CNR2 (0.39) | CA12CA1CA2CA7CA9 | |
| SCHEMBL31650660 | 0.81 | TP53 (0.50) | KDM4EGAAMAPTALDH1A1HPGD | |
| SCHEMBL685679 | 0.81 | TSHR (0.46) | CA12CA1CA2CA7CA9 | |
| SCHEMBL686123 | 0.81 | TP53 (0.50) | KDM4EGAAMAPTALDH1A1HPGD | |
| SCHEMBL7746071 | 0.81 | PKM (0.34) | CA12CA1CA2CA7CA9 | |
| SCHEMBL11145835 | 0.79 | HSP90AA1 (0.49) | CA1CA2ALDH1A1HPGDHSD17B10 | |
| SCHEMBL13104059 | 0.79 | ALDH1A1 (0.50) | CA12CA1CA2CA9KDM4E | |
| SCHEMBL7882279 | 0.79 | SNCA (0.44) | KDM4ESNCAHSD17B10 | |
| SCHEMBL10040368 | 0.79 | IDO1 (0.39) | CA12CA1CA2CA7CA9 | |
| SCHEMBL10336410 | 0.79 | HSD17B10 (0.48) | GAAALDH1A1HPGDHSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117820539-B | Aldehyde-free color fixing agent for dyeing polyamide acid dye, and preparation method and application thereof | 四川省纺织科学研究院有限公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117820539-A | Aldehyde-free color fixing agent for dyeing polyamide acid dye, and preparation method and application thereof | 四川省纺织科学研究院有限公司 | 2024-04-05 | — | — | CN | claimed |
| CN-117511316-A | Scratch-resistant acrylate coating and preparation method thereof | 东莞市瑞盟涂料有限公司 | 2024-02-06 | — | — | CN | claimed |
| WO-2024150676-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION | 富士フイルム株式会社 | 2024-07-18 | — | — | WO | disclosed |
| CN-117820539-B | Aldehyde-free color fixing agent for dyeing polyamide acid dye, and preparation method and application thereof | 四川省纺织科学研究院有限公司 | 2024-05-07 | — | — | CN | disclosed |
| CN-117820539-A | Aldehyde-free color fixing agent for dyeing polyamide acid dye, and preparation method and application thereof | 四川省纺织科学研究院有限公司 | 2024-04-05 | — | — | CN | disclosed |
| EP-4318681-A1 | HYDROPHILIC POLYMER AND MANUFACTURING METHOD THEREFOR, AND LITHIUM SECONDARY BATTERY COMPRISING HYDROPHILIC POLYMER | Contemporary Amperex Technology Co., Limited (CN) | 2024-02-07 | — | — | EP | disclosed |
| CN-117511316-A | Scratch-resistant acrylate coating and preparation method thereof | 东莞市瑞盟涂料有限公司 | 2024-02-06 | — | — | CN | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20230205087-A1 | PHOTORESIST UNDERLAYER COMPOSITION | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2023-06-29 | — | — | US | disclosed |
| CN-110862492-B | Silane modified polyether resin and preparation method and application thereof | 万华化学集团股份有限公司 | 2022-04-19 | — | — | CN | disclosed |
| US-20110318688-A1 | SALT, ACID GENERATOR AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110318688-A1 | SALT, ACID GENERATOR AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20110111342-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-6211328-B1 | IN PRESENCE OF AN ACID | GUN EI CHEMICAL INDUSTRY CO., LTD (JP) | 2001-04-03 | — | — | US | disclosed |
| US-5087548-A | POSITIVE TYPE RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., INC. (JP) | 1992-02-11 | — | — | US | disclosed |
| EP-0227487-A2 | Positive type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-07-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110318688-A1 | SALT, ACID GENERATOR AND RESIST COMPOSITION | RER1, FGFR1, NHERF1 | CA12 234/4885CA1 69/4885CA2 33/4885 |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CLIC1, SLC10A6, APOL1 | CA12 468/4885CA1 799/4885CA2 137/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.