Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL6862916

N.O=S(=O)(O)OS(=O)(=O)OO.[Fe]

nearest known ligand 0.35

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Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.35
TSHR P16473 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL35790 0.97 CA2 (0.37) CA2TSHRTDP1
Ammonia Solution, Strong SCHEMBL7119873 0.97 CA2 (0.37) CA2TSHRTDP1
Ammonia Solution, Strong SCHEMBL10698109 0.94 CA2 (0.35) CA2TSHRTDP1
Sulfuric Acid SCHEMBL14481302 0.94 CA5A (0.35) CA2TSHRTDP1
Ammonia Solution, Strong SCHEMBL19874478 0.94 CA2 (0.35) CA2TSHRTDP1
SCHEMBL19624 0.94 CA2 (0.39) CA2TSHRTDP1
SCHEMBL2680156 0.91 CA2 (0.37) CA2TSHRTDP1
SCHEMBL1847016 0.91 CA2 (0.37) CA2TSHRTDP1
SCHEMBL513155 0.91 CA2 (0.37) CA2TSHRTDP1
Sulfuric Acid SCHEMBL10645863 0.91 CA5A (0.38) CA2TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6818031-B2 A POLISHING FORMUALTION CONSISTS OF AN ABRASIVE, AN OXIDIZING AGENT, A POLISHING ACCELERATOR(AN ORGANIC PHOSPHONIC ACID), AND WATER KAO CORPORATION (JP) 2004-11-16 US disclosed
US-20020194789-A1 A polishing formualtion consists of an abrasive, an oxidizing agent, a polishing accelerator(an organic phosphonic acid), and water KAO CORPORATION (JP) 2002-12-26 US disclosed