SCHEMBL6863104

SCHEMBL6863104

CC(OC=Cc1ccc(CC(C)(C)Oc2ccc(C=CC=Cc3ccc(O)cc3)cc2)cc1)OC1CCCCC1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
STAT3 P40763 1/20 0.30
PPARG P37231 1/20 0.30
PPARA Q07869 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5702441 0.88 STAT3 (0.31) STAT3
SCHEMBL6871803 0.87 POLB (0.30)
SCHEMBL6875173 0.84 STAT3 (0.37) STAT3PPARGPPARA
SCHEMBL3837628 0.83 PPARG (0.30) PPARGPPARA
SCHEMBL6873848 0.82 APP (0.33) STAT3PPARGPPARA
SCHEMBL6883650 0.76 POLB (0.32)
SCHEMBL3843023 0.76 APP (0.41) STAT3
SCHEMBL6865759 0.75 STAT3 (0.33) STAT3PPARGPPARA
SCHEMBL6552992 0.73 CYP2C19 (0.40)
SCHEMBL6861956 0.73 PPARG (0.34) PPARGPPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6716573-B2 Resist Composition WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-06 US disclosed
US-6586152-B1 Useful as an ingredient of a resist composition used for preparation of semiconductor devices and the like, which comprises a compound shown by the following general formula useful as an ingredient of a resist composition used for WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-07-01 US disclosed
US-20030039920-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2003-02-27 US disclosed
US-6432608-B1 FINENESS PATTERN WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2002-08-13 US disclosed