SCHEMBL3843023

SCHEMBL3843023

CC(Oc1ccc(C=CC=Cc2ccc(O)cc2)cc1)OC1CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.41
STAT3 P40763 1/20 0.39
MAPT P10636 4/20 0.37
PTGS2 P35354 3/20 0.37
KMT2A Q03164 3/20 0.37
RAB9A P51151 3/20 0.37
TTR P02766 2/20 0.37
CYP1A1 P04798 2/20 0.37
ALOX5 P09917 2/20 0.37
CYP1B1 Q16678 2/20 0.37
KDM4E B2RXH2 2/20 0.37
NPC1 O15118 2/20 0.37
MEN1 O00255 2/20 0.37
ABL1 P00519 1/20 0.37
ABCB1 P08183 1/20 0.37
GAA P10253 1/20 0.37
BCR P11274 1/20 0.37
NQO2 P16083 1/20 0.37
PTGS1 P23219 1/20 0.37
MAPK1 P28482 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7269876 0.88 STAT3 (0.37) APPSTAT3MAPTKMT2ARAB9A
Acrylic Acid Methyl Ester SCHEMBL7264983 0.88 CA12 (0.40) STAT3MAPTKMT2ARAB9ANPC1
SCHEMBL11125523 0.87 KDM4E (0.38) PTGS2KMT2ARAB9AKDM4ENPC1
SCHEMBL7269899 0.87 STAT3 (0.38) STAT3MAPTKMT2ARAB9ANPC1
SCHEMBL7270930 0.87 STAT3 (0.36) APPSTAT3MAPTKMT2ARAB9A
SCHEMBL3839026 0.85 STAT3 (0.35) APPSTAT3MAPTPTGS2KMT2A
SCHEMBL23907140 0.85 MEN1 (0.42) KMT2ARAB9AKDM4ENPC1MEN1
SCHEMBL3841532 0.85 STAT3 (0.34) STAT3CA12CA1CA2CA7
SCHEMBL6387605 0.84 APP (0.38) APPSTAT3MAPTPTGS2KMT2A
SCHEMBL3838221 0.83 TRPM8 (0.37) MAPTMAPK1CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1449833-B1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION WAKO PURE CHEM IND LTD (JP) 2009-09-09 EP disclosed
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
EP-1314725-B1 SULFONIUM SALT COMPOUND WAKO PURE CHEM IND LTD (JP) 2008-03-19 EP disclosed
US-6924323-B2 Sulfonium salt compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2005-08-02 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed
US-6723483-B1 Sulfonium salt compounds WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2004-04-20 US disclosed
US-20040033434-A1 Sulfonium salt compound FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2004-02-19 US disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
EP-1314725-A1 SULFONIUM SALT COMPOUND Wako Pure Chemical Industries, Ltd. (JP) 2003-05-28 EP disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed
EP-0588544-A2 Fine pattern forming material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1994-03-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 APP 928/4885STAT3 4778/4885MAPT 868/4885
US-20040033434-A1 Sulfonium salt compound SPIN1, RER1, SPIN2B APP 3069/4885STAT3 2127/4885MAPT 2666/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.