SCHEMBL6863134

SCHEMBL6863134

CCCOC(=O)C12CC3CC(C1)CC(C14CC5CC(CC(C(=O)OCCC)(C5)C1)C4)(C3)C2

nearest known ligand 0.57

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 3/20 0.57
ALDH1A1 P00352 3/20 0.42
L3MBTL1 Q9Y468 2/20 0.40
MEN1 O00255 3/20 0.40
KMT2A Q03164 3/20 0.40
LMNA P02545 3/20 0.39
MAPT P10636 1/20 0.39
RXFP1 Q9HBX9 1/20 0.38
PRKCA P17252 1/20 0.38
GAA P10253 1/20 0.38
ABL1 P00519 1/20 0.38
TSHR P16473 1/20 0.38
RIN1 Q13671 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL692491 0.92 NPSR1 (0.67) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL29135604 0.86 NPSR1 (0.60) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL7475995 0.84 NPSR1 (0.53) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL692776 0.82 NPSR1 (0.63) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL6231540 0.80 NPSR1 (0.50) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL13084353 0.79 NPSR1 (0.60) NPSR1ALDH1A1TSHR
SCHEMBL691868 0.79 NPSR1 (0.60) NPSR1ALDH1A1TSHR
SCHEMBL13637738 0.78 NPSR1 (0.48) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL12104073 0.78 NPSR1 (0.45) NPSR1ALDH1A1L3MBTL1MEN1KMT2A
SCHEMBL691923 0.78 NPSR1 (0.61) NPSR1ALDH1A1L3MBTL1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6803170-B2 MIXTURE CONTAINING ACID GENERATOR SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) 2004-10-12 US disclosed
EP-1179749-B1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TEC (JP) 2003-10-08 EP disclosed
US-20020022193-A1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 2002-02-21 US disclosed
EP-1179749-A1 Resist composition and method for manufacturing semiconductor device using the resist composition Semiconductor Leading Edge Technologies, Inc. (JP) 2002-02-13 EP disclosed