Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | ESR1 | P03372 | 3/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | CA7 | P43166 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | MAOA | P21397 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14839354 | 0.95 | TSHR (0.47) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL15799989 | 0.94 | ESR1 (0.54) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL16119470 | 0.94 | MAPT (0.47) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL12959101 | 0.94 | RAB9A (0.47) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL14497538 | 0.93 | TSHR (0.45) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL14839401 | 0.93 | TSHR (0.47) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL14491810 | 0.93 | TSHR (0.48) | TSHRMEN1KMT2AESR1LMNA | |
| SCHEMBL17465564 | 0.93 | POLB (0.46) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL9215046 | 0.93 | TSHR (0.45) | TSHRMEN1KMT2AESR1CA12 | |
| SCHEMBL16077672 | 0.93 | TSHR (0.55) | TSHRMEN1KMT2ACA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 234 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12016187-B2 | Encapsulating composition | LG CHEM, LTD. (KR) | 2024-06-18 | — | — | US | claimed |
| US-20210234111-A1 | Encapsulating Composition | LG CHEM, LTD. (KR) | 2021-07-29 | — | — | US | claimed |
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| EP-3633455-B1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMERIC PRECURSOR, CURED FILM, LAMINATE, CURED FILM PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-3859447-B1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-12473403-B2 | Curable resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and polymer precursor | FUJIFILM CORPORATION (JP) | 2025-11-18 | — | — | US | disclosed |
| EP-4636485-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-10-22 | — | — | EP | disclosed |
| EP-2312593-A1 | INSULATING SHEET AND MULTILAYER STRUCTURE | Sekisui Chemical Co., Ltd. (JP) | 2011-04-20 | — | — | EP | disclosed |
| US-20100297453-A1 | INSULATING SHEET AND MULTILAYER STRUCTURE | SEKISUI CHEMICAL CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100130697-A1 | Thermosetting Resin Composition | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |
| US-20100130697-A1 | Thermosetting Resin Composition | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2010-05-27 | — | — | US | disclosed |
| CN-100474062-C | Radiation sensitive resin composition for forming microlens | JSR CORP (JP) | 2009-04-01 | — | — | CN | disclosed |
| EP-2011789-A1 | Compositions containing oxetane compounds for use in semiconductor packaging | NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) | 2009-01-07 | — | — | EP | disclosed |
| US-7230055-B2 | Compositions containing oxetane compounds for use in semiconductor packaging | NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) | 2007-06-12 | — | — | US | disclosed |
| US-7230055-B2 | Compositions containing oxetane compounds for use in semiconductor packaging | NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) | 2007-06-12 | — | — | US | disclosed |
| CN-1743913-A | Radiation sensitive resin composition for forming microlens | JSR CORP (JP) | 2006-03-08 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | TSHR 3214/4885MEN1 4037/4885KMT2A 668/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.