SCHEMBL6865274

SCHEMBL6865274

CC(C)(CC(=O)O)C12CC3CC(CC(C3)C1)C2.CC(C)(CC(=O)O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.38
CHRM1 P11229 1/20 0.38
TBXA2R P21731 1/20 0.38
ADRA1A P35348 1/20 0.38
ALDH1A1 P00352 2/20 0.37
KDM4E B2RXH2 1/20 0.37
HTT P42858 1/20 0.37
CYP2D6 P10635 1/20 0.37
TSHR P16473 1/20 0.37
CYP2C19 P33261 1/20 0.37
HIF1A Q16665 1/20 0.37
EPHX2 P34913 4/20 0.37
ALOX5 P09917 1/20 0.36
THRB P10828 1/20 0.34
CYP2C9 P11712 1/20 0.34
HSD17B10 Q99714 1/20 0.34
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6865266 0.84 POLB (0.36) HMGCRCHRM1TBXA2RADRA1AALDH1A1
SCHEMBL17061032 0.82 TET2 (0.43) ALDH1A1THRBCYP2C9HSD17B10LMNA
SCHEMBL14118984 0.78 KMT2A (0.33) ALDH1A1EPHX2HSD17B10LMNA
SCHEMBL13952908 0.78 ALDH1A1 (0.33) ALDH1A1TSHRHSD17B10LMNA
SCHEMBL21362815 0.77 ALDH1A1 (0.34) ALDH1A1THRBCYP2C9HSD17B10LMNA
SCHEMBL6864589 0.76 ALDH1A1 (0.37) ALDH1A1KDM4EHTTTSHREPHX2
SCHEMBL18844971 0.76 SMN1; SMN2 (0.38) ALDH1A1KDM4EHTTTSHREPHX2
Acetic Acid SCHEMBL700515 0.72 THRB (0.42) ALDH1A1HTTTSHREPHX2THRB
SCHEMBL4990698 0.72 THRB (0.38) ALDH1A1HTTEPHX2THRBCYP2C9
SCHEMBL28206894 0.72 KMT2A (0.34) CYP2D6TSHRCYP2C19THRBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6803170-B2 MIXTURE CONTAINING ACID GENERATOR SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) 2004-10-12 US claimed
EP-1179749-B1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TEC (JP) 2003-10-08 EP claimed
US-20020022193-A1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 2002-02-21 US claimed
EP-1179749-A1 Resist composition and method for manufacturing semiconductor device using the resist composition Semiconductor Leading Edge Technologies, Inc. (JP) 2002-02-13 EP claimed
US-6803170-B2 MIXTURE CONTAINING ACID GENERATOR SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) 2004-10-12 US disclosed
EP-1179749-B1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TEC (JP) 2003-10-08 EP disclosed
US-20020022193-A1 Resist composition and method for manufacturing semiconductor device using the resist composition SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. 2002-02-21 US disclosed
EP-1179749-A1 Resist composition and method for manufacturing semiconductor device using the resist composition Semiconductor Leading Edge Technologies, Inc. (JP) 2002-02-13 EP disclosed