Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.73 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.52 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.52 |
| ▸ | ESR1 | P03372 | 2/20 | 0.45 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.45 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.42 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.42 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.42 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | ALK | Q9UM73 | 1/20 | 0.38 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.37 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | MAOA | P21397 | 1/20 | 0.36 |
| ▸ | MAOB | P27338 | 1/20 | 0.36 |
| ▸ | CISD1 | Q9NZ45 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29941878 | 1.00 | SHBG (0.73) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL30003132 | 1.00 | SHBG (0.73) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL2386514 | 1.00 | SHBG (0.73) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL4057392 | 0.95 | SHBG (0.67) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL7714483 | 0.95 | SHBG (0.67) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL2754949 | 0.90 | SHBG (0.60) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL68876 | 0.88 | SHBG (0.67) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL30003742 | 0.88 | SHBG (0.63) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL2384360 | 0.88 | SHBG (0.63) | SHBGHMGB1CXCL12ESR1ESR2 | |
| SCHEMBL30004950 | 0.88 | SHBG (0.58) | SHBGHMGB1CXCL12ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | claimed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | claimed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| EP-1614005-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-01-11 | — | — | EP | claimed |
| US-6905809-B2 | Photoresist compositions | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-06-14 | — | — | US | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| WO-2004088424-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197696-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| EP-2203783-B1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2019-11-13 | — | — | EP | disclosed |
| US-9851639-B2 | Photoacid generating polymers containing a urethane linkage for lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-12-26 | — | — | US | disclosed |
| US-8828493-B2 | Methods of directed self-assembly and layered structures formed therefrom | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-09 | — | — | US | disclosed |
| US-6083657-A | PHENOL-FORMALDEHYDE RESIN AND QUINONEDIAZIDE COMPOUND; SEMICONDUCTORS, INTEGRATED CIRCUITS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| EP-0902326-A2 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |
| US-5853948-A | Positive photoresist compositions and multilayer resist materials using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5618932-A | Photoactive compounds and compositions | SHIPLEY COMPANY, L.L.C. (US) | 1997-04-08 | — | — | US | disclosed |
| US-5514515-A | Photoactive compounds having a heterocyclic group used in photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 1996-05-07 | — | — | US | disclosed |