SCHEMBL30004950

SCHEMBL30004950

CCc1cc(Cc2cc(CC)c(O)c(Cc3cc(C)c(O)c(C)c3)c2)cc(Cc2cc(C)c(O)c(C)c2)c1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.58
HMGB1 P09429 1/20 0.50
CXCL12 P48061 1/20 0.50
DHFR P00374 2/20 0.47
PTPN1 P18031 2/20 0.41
PTPN2 P17706 1/20 0.41
PTPN6 P29350 1/20 0.41
HSPA5 P11021 1/20 0.41
PTGS1 P23219 2/20 0.40
PTGS2 P35354 2/20 0.40
ALOX5 P09917 1/20 0.40
ESR1 P03372 2/20 0.39
ESR2 Q92731 2/20 0.39
GABRA1 P14867 1/20 0.39
GABRB2 P47870 1/20 0.39
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
ALK Q9UM73 1/20 0.37
MAOA P21397 1/20 0.36
MAOB P27338 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2385253 1.00 SHBG (0.58) SHBGHMGB1CXCL12DHFRPTPN1
SCHEMBL4065757 1.00 SHBG (0.58) SHBGHMGB1CXCL12DHFRPTPN1
SCHEMBL30003742 0.96 SHBG (0.63) SHBGHMGB1CXCL12DHFRPTPN1
SCHEMBL2384360 0.96 SHBG (0.63) SHBGHMGB1CXCL12DHFRPTPN1
SCHEMBL4057392 0.92 SHBG (0.67) SHBGHMGB1CXCL12DHFRPTPN1
SCHEMBL7714483 0.92 SHBG (0.67) SHBGHMGB1CXCL12DHFRPTPN1
SCHEMBL15830868 0.91 SHBG (0.53) SHBGHMGB1CXCL12DHFRHSPA5
SCHEMBL7899901 0.91 SHBG (0.47) SHBGHMGB1CXCL12DHFRHSPA5
SCHEMBL3194655 0.90 SHBG (0.55) SHBGHMGB1CXCL12DHFRHSPA5
SCHEMBL69627 0.90 SHBG (0.70) SHBGHMGB1CXCL12DHFRPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119620544-A Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article 东京应化工业株式会社 2025-03-14 CN disclosed
CN-117939914-A Structure, display element, pattern for partition wall, and method for forming the same 东京应化工业株式会社 2024-04-26 CN disclosed
CN-111205648-B Curable composition, cured product, microlens, and optical element 东京应化工业株式会社 2023-12-08 CN disclosed
CN-106933034-B Positive photoresist composition 东京应化工业株式会社 2023-01-06 CN disclosed
CN-108884574-B Coating agent for forming metal oxide film and method for producing substrate having metal oxide film 东京应化工业株式会社 2022-10-14 CN disclosed