Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO2 | P16083 | 1/20 | 0.61 |
| ▸ | PLAU | P00749 | 1/20 | 0.61 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.58 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.44 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | CASP1 | P29466 | 1/20 | 0.43 |
| ▸ | CASP7 | P55210 | 1/20 | 0.43 |
| ▸ | HBB | P68871 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.42 |
| ▸ | CASP6 | P55212 | 2/20 | 0.42 |
| ▸ | NSD2 | O96028 | 1/20 | 0.42 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.42 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31110337 | 1.00 | NQO2 (0.61) | NQO2PLAUTRPM4CYP1A2CTDSP1 | |
| SCHEMBL8196720 | 0.76 | NQO2 (0.67) | NQO2PLAUTRPM4CYP1A2ALDH1A1 | |
| SCHEMBL7218852 | 0.76 | ALDH1A1 (0.48) | NQO2PLAUTRPM4CYP1A2ALDH1A1 | |
| SCHEMBL28681 | 0.76 | NQO2 (1.00) | NQO2PLAUTRPM4CYP1A2ALDH1A1 | |
| SCHEMBL29351048 | 0.76 | NQO2 (1.00) | NQO2PLAUTRPM4CYP1A2ALDH1A1 | |
| SCHEMBL5147716 | 0.76 | NQO2 (1.00) | NQO2PLAUTRPM4CYP1A2ALDH1A1 | |
| SCHEMBL29487594 | 0.76 | ALDH1A1 (0.54) | NQO2PLAUTRPM4CYP1A2ALDH1A1 | |
| SCHEMBL2153752 | 0.76 | ALDH1A1 (0.54) | NQO2PLAUTRPM4CYP1A2ALDH1A1 | |
| SCHEMBL588930 | 0.76 | PLAU (1.00) | NQO2PLAUCYP1A2CTDSP1ALDH1A1 | |
| SCHEMBL30334777 | 0.76 | PLAU (1.00) | NQO2PLAUCYP1A2CTDSP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 239 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119781246-A | Photosensitive polyimide resin composition, cured film, and preparation method and application thereof | 吉林奥来德光电材料股份有限公司 | 2025-04-08 | — | — | CN | claimed |
| CN-115010924-B | Photosensitive polyimide resin composition, polyimide resin film containing photosensitive polyimide resin composition and application of photosensitive polyimide resin composition | 吉林奥来德光电材料股份有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-115010924-A | Photosensitive polyimide resin composition, polyimide resin film containing same and application of polyimide resin film | 吉林奥来德光电材料股份有限公司 | 2022-09-06 | — | — | CN | claimed |
| CN-111766727-A | Polyimide substrate for flexible liquid crystal display and preparation method thereof | 浙江中科玖源新材料有限公司 | 2020-10-13 | — | — | CN | claimed |
| CN-106810695-B | A kind of aromatic polyesterimides and preparation method thereof | 苏州大学 | 2019-09-06 | — | — | CN | claimed |
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | claimed |
| CN-106810695-A | A kind of aromatic polyesterimides and preparation method thereof | 苏州大学 | 2017-06-09 | — | — | CN | claimed |
| US-20090240033-A1 | AFFINITY MATRIX LIBRARY AND ITS USE | LI RONGXIU | 2009-09-24 | — | — | US | claimed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4660704-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250355350-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4650874-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED COATING, INTERLAYER INSULATING FILM, SURFACE PROTECTING FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| EP-4636011-A1 | POLYMER, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-4960860-A | POLYIMIDES HARDNER FOR EPXOY RESINS FOR LAMINATION AND MOLDING | SUMITOMO CHEMICAL CO., LTD. (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4888407-A | Imide compound and composition containing the same | SUMITOMO CHEMICAL CO., LTD. (JP) | 1989-12-19 | — | — | US | disclosed |
| US-4794148-A | POLYIMIDE-EPOXY RESIN BLEND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-12-27 | — | — | US | disclosed |
| EP-0277742-A2 | Fiber-reinforced composite material | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-08-10 | — | — | EP | disclosed |
| EP-0273731-A1 | Imide compound and composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-07-06 | — | — | EP | disclosed |
| US-4176134-A | A CHEMICAL INTERMEDIATE FOR CYAN-DYE RELEASING REDOX COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | NQO2 1310/4885PLAU 3173/4885TRPM4 3336/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | NQO2 4690/4885PLAU 1440/4885TRPM4 391/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.