Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | LDHA | P00338 | 1/20 | 0.30 |
| ▸ | LDHB | P07195 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27696587 | 0.73 | LMNA (0.58) | LMNAALOX15BLMPMP22TDP1 | |
| SCHEMBL4141273 | 0.73 | LMNA (0.58) | LMNAALOX15BLMPMP22TDP1 | |
| SCHEMBL4779556 | 0.73 | LMNA (0.58) | LMNAALOX15BLMPMP22TDP1 | |
| SCHEMBL20550221 | 0.73 | FFAR3 (0.35) | — | |
| SCHEMBL28006685 | 0.72 | TDP1 (0.31) | LMNAALOX15BLMPMP22TDP1 | |
| SCHEMBL27476647 | 0.70 | LMNA (0.54) | LMNAALOX15BLMPMP22TDP1 | |
| SCHEMBL11464126 | 0.67 | — | — | |
| SCHEMBL3360476 | 0.67 | — | — | |
| SCHEMBL17241077 | 0.67 | — | — | |
| SCHEMBL15605 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110462797-B | Polishing composition | 福吉米株式会社 | 2023-09-22 | — | — | CN | disclosed |
| CN-110998800-B | Polishing liquid, polishing liquid set and polishing method | 株式会社力森诺科 | 2023-09-22 | — | — | CN | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| CN-111433311-A | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | 日立化成株式会社 | 2020-07-17 | — | — | CN | disclosed |
| CN-111040731-A | Composition for polishing silicon wafer | 福吉米株式会社 | 2020-04-21 | — | — | CN | disclosed |
| CN-110998800-A | Polishing liquid, polishing liquid set and polishing method | 日立化成株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-106233424-B | Silicon Wafer composition for polishing | 福吉米株式会社 | 2018-12-25 | — | — | CN | disclosed |
| CN-104471339-B | Carry efficient energy regenerating ventilation core | 科腾聚合物美国有限责任公司 | 2018-10-12 | — | — | CN | disclosed |
| CN-103906808-B | Polyoxyalkyleneamine modified sulfonated block copolymers, their preparation and their use | 科腾聚合物美国有限责任公司 | 2017-01-18 | — | — | CN | disclosed |
| CN-106233424-A | Silicon Wafer composition for polishing | 福吉米株式会社 | 2016-12-14 | — | — | CN | disclosed |
| CN-100377310-C | CMP polishing compound and polishing method | HITACHI CHEMICAL CO LTD (JP) | 2008-03-26 | — | — | CN | disclosed |
| CN-1278853-C | Image recording material | FUJI PHOTO FILM CO LTD (JP) | 2006-10-11 | — | — | CN | disclosed |
| CN-1745460-A | CMP polishing slurry and polishing method | HITACHI CHEMICAL CO LTD (JP) | 2006-03-08 | — | — | CN | disclosed |
| CN-1495524-A | Polymeric composition and lithographic printing platemaking forebody | 富士胶片株式会社 | 2004-05-12 | — | — | CN | disclosed |
| EP-1389521-A2 | Thermosensitive/photosensitive resin composition | Fuji Photo Film Co., Ltd. (JP) | 2004-02-18 | — | — | EP | disclosed |
| CN-1406747-A | Image recording material | FUJI PHOTO FILM CO LTD (JP) | 2003-04-02 | — | — | CN | disclosed |
| EP-0758361-B1 | POLYMERISABLE COMPOSITION AND THE USE THEREOF | NOVARTIS AG (CH) | 2000-11-15 | — | — | EP | disclosed |
| US-5852126-A | Polymerisable composition and the use thereof | NOVARTIS AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0758361-A1 | POLYMERISABLE COMPOSITON AND THE USE THEREOF | Novartis AG (CH) | 1997-02-19 | — | — | EP | disclosed |
| WO-1995029959-A1 | POLYMERISABLE COMPOSITON AND THE USE THEREOF | CIBA-GEIGY AG (CH) | 1995-11-09 | — | — | WO | disclosed |