⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6547948 | 1.00 | — | — | |
| SCHEMBL688447 | 1.00 | — | — | |
| SCHEMBL4312931 | 0.72 | — | — | |
| SCHEMBL10981310 | 0.69 | KEAP1 (0.32) | — | |
| SCHEMBL2589699 | 0.69 | — | — | |
| SCHEMBL14599339 | 0.69 | — | — | |
| SCHEMBL27918599 | 0.69 | KEAP1 (0.32) | — | |
| SCHEMBL182830 | 0.69 | — | — | |
| Crotonic Acid SCHEMBL7197879 | 0.69 | — | — | |
| Crotonic Acid SCHEMBL7197870 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| EP-1970761-B1 | Photosensitive composition and method of producing a cured relief pattern | FUJIFILM CORP (JP) | 2012-02-29 | — | — | EP | disclosed |
| US-20100080963-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7615324-B2 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20080227024-A1 | PHOTOSENSITIVE COMPOSITION, AND CURED RELIEF PATTERN PRODUCTION METHOD AND SEMICONDUCTOR DEVICE USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-09-18 | — | — | US | disclosed |
| EP-1970761-A1 | Photosensitive composition, and cured relief pattern production method and semiconductor device using the same | FUJIFILM Corporation (JP) | 2008-09-17 | — | — | EP | disclosed |
| US-7022456-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| US-6743562-B2 | ACID GENERATORS; FOR THE PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20040048190-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-11 | — | — | US | disclosed |
| US-20020172886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2002-11-21 | — | — | US | disclosed |