⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6547948 | 1.00 | — | — | |
| SCHEMBL688446 | 1.00 | — | — | |
| SCHEMBL4312931 | 0.72 | — | — | |
| SCHEMBL10981310 | 0.69 | KEAP1 (0.32) | — | |
| SCHEMBL2589699 | 0.69 | — | — | |
| SCHEMBL14599339 | 0.69 | — | — | |
| SCHEMBL27918599 | 0.69 | KEAP1 (0.32) | — | |
| SCHEMBL182830 | 0.69 | — | — | |
| Crotonic Acid SCHEMBL7197879 | 0.69 | — | — | |
| Crotonic Acid SCHEMBL7197870 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108135211-A | Gum bases and chewing gums using heat sensitive polymers | WM.雷格利 JR.公司 | 2018-06-08 | — | — | CN | claimed |
| WO-2020226150-A1 | COMPOUND AND PRODUCTION METHOD THEREOF, RESIN, COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, UNDERLAYER FILM FOR LITHOGRAPHY, OPTICAL COMPONENT, AND METHOD FOR PURIFYING COMPOUND OR RESIN | 学校法人 関西大学 | 2020-11-12 | — | — | WO | disclosed |
| CN-108135211-A | Gum bases and chewing gums using heat sensitive polymers | WM.雷格利 JR.公司 | 2018-06-08 | — | — | CN | disclosed |
| CN-105934448-B | (methyl) acrylate compounds, (methyl) acrylic copolymer and include its photosensitive polymer combination | 三菱瓦斯化学株式会社 | 2018-02-09 | — | — | CN | disclosed |
| CN-104185803-B | Polarized film, optical film, and image display device | 日东电工株式会社 | 2017-05-24 | — | — | CN | disclosed |
| CN-105960419-A | (meth)acrylic acid ester compound and production method therefor | 三菱瓦斯化学株式会社 | 2016-09-21 | — | — | CN | disclosed |
| CN-105934448-A | (meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same | 三菱瓦斯化学株式会社 | 2016-09-07 | — | — | CN | disclosed |
| EP-1659166-B1 | Hydraulic oil composition for shock absorbers | NIPPON OIL CORP (JP) | 2013-08-21 | — | — | EP | disclosed |
| US-8173349-B2 | Photosensitive resin composition, polymer compound, method of forming a pattern, and electronic device | FUJIFILM CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| EP-1970761-B1 | Photosensitive composition and method of producing a cured relief pattern | FUJIFILM CORP (JP) | 2012-02-29 | — | — | EP | disclosed |
| US-7022456-B2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2006-04-04 | — | — | US | disclosed |
| EP-1354083-B1 | DYEABLE POLYOLEFIN FIBERS AND FABRICS | CIBA SC HOLDING AG (CH) | 2006-02-15 | — | — | EP | disclosed |
| CN-1205204-C | 3-hydroxymethylbenzo [b] thiphene derivatives and process for their preparation | TEIJIN LTD (JP) | 2005-06-08 | — | — | CN | disclosed |
| US-6743562-B2 | ACID GENERATORS; FOR THE PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS, PHOTORESISTS | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-01 | — | — | US | disclosed |
| US-20040048190-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-11 | — | — | US | disclosed |
| EP-1379238-A1 | FAVORABLE MODULATION OF HEALTH-RELATED QUALITY OF LIFE AND HEALTH-RELATED QUALITY-ADJUSTED TIME-TO-PROGRESSION OF DISEASE IN PATIENTS WITH PROSTATE CANCER | Abbott Laboratories (US) | 2004-01-14 | — | — | EP | disclosed |
| CN-1462271-A | 3-hydroxymethylbenzo [b] thiphene derivatives and process for their preparation | TEIJIN LTD (JP) | 2003-12-17 | — | — | CN | disclosed |
| US-20030092757-A1 | Favorable modulation of health-related quality of life and health-related quality-adjusted time-to-progression of disease in patients with prostate cancer | ABBOTT LABORATORIES | 2003-05-15 | — | — | US | disclosed |
| US-20020172886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. | 2002-11-21 | — | — | US | disclosed |
| WO-2002085351-A1 | FAVORABLE MODULATION OF HEALTH-RELATED QUALITY OF LIFE AND HEALTH-RELATED QUALITY-ADJUSTED TIME-TO-PROGRESSION OF DISEASE IN PATIENTS WITH PROSTATE CANCER | ABBOTT LABORATORIES (US) | 2002-10-31 | — | — | WO | disclosed |