Known targets — ChEMBL curated mechanism
ADRA1AADRA1BADRA1DADRB1ADRB2ADRB3CYP11B1DPP4FGFR1FGFR2FGFR3FGFR4HRH1JAK1JAK2JAK3KCNA1KCNA10KCNA2KCNA3KCNA4KCNA5KCNA6KCNA7KCNB1KCNB2KCNC1KCNC2KCNC3KCNC4KCND1KCND2KCND3KCNF1KCNG1KCNG2KCNG3KCNG4KCNH1KCNH2KCNH3KCNH4KCNH5KCNH6KCNH7KCNH8KCNQ1KCNQ2KCNQ3KCNQ4KCNQ5KCNS1KCNS2KCNS3KCNV1KCNV2KDRKITNAOPRD1OPRK1OPRM1PPDGFRBPIK3CDSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASMOTYK2polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.70 |
| ▸ | TP53 | P04637 | 3/20 | 0.70 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.70 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.70 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.62 |
| ▸ | HPGD | P15428 | 1/20 | 0.56 |
| ▸ | THRB | P10828 | 4/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.33 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphoric Acid SCHEMBL2326265 | 0.93 | TSHR (0.68) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Phosphoric Acid SCHEMBL28250507 | 0.91 | TSHR (0.59) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Phosphoric Acid SCHEMBL7553042 | 0.91 | TSHR (0.71) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Phosphoric Acid SCHEMBL7552988 | 0.91 | TSHR (0.78) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL30604742 | 0.89 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL93462 | 0.89 | TSHR (0.84) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Phosphoric Acid SCHEMBL1170254 | 0.89 | TSHR (0.83) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Phosphoric Acid SCHEMBL28332285 | 0.89 | TSHR (0.56) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| SCHEMBL900042 | 0.87 | TSHR (0.80) | TSHRALDH1A1TP53HIF1AHSD17B10 | |
| Ethylene SCHEMBL1165263 | 0.87 | TSHR (0.80) | TSHRALDH1A1TP53HIF1AHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-54053145-A | — | — | None | — | — | JP | disclosed |
| EP-4394509-A1 | PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC PLATE | Zeon Corporation (JP) | 2024-07-03 | — | — | EP | disclosed |
| WO-2023026928-A1 | PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC PLATE | 日本ゼオン株式会社 | 2023-03-02 | — | — | WO | disclosed |
| CN-107111235-B | Protective film for dry film resist and photosensitive resin laminate | 三菱化学株式会社 | 2020-11-10 | — | — | CN | disclosed |
| EP-3478755-A1 | PHOSPHONATE MODIFIED METAL OXIDE PARTICLE | Dow Global Technologies, LLC (US) | 2019-05-08 | — | — | EP | disclosed |
| WO-2018000295-A1 | PHOSPHONATE MODIFIED METAL OXIDE PARTICLE | DOW GLOBAL TECHNOLOGIES LLC (US) | 2018-01-04 | — | — | WO | disclosed |
| US-6818382-B2 | PHOTOCURABLE URETHANE (METH)ACRYLATE COMPOUND HAVING A CARBOXYL GROUP, A THERMOSETTING RESIN, PHOTOPOLYMERIZATION INITIATOR AND A THERMO POLYMERIZATION CATALYST | SHOWA DENKO K.K. (JP) | 2004-11-16 | — | — | US | disclosed |
| EP-1317691-A2 | PHOTOSENSITIVE COMPOSITION, CURED ARTICLE THEREOF, AND PRINTED CIRCUIT BOARD USING THE SAME | Showa Denko K.K. (JP) | 2003-06-11 | — | — | EP | disclosed |
| US-20030003398-A1 | Photosensitive composition, cured article thereof, and printed circuit board using the same | SHOWA DENKO K.K. (JP) | 2003-01-02 | — | — | US | disclosed |
| EP-0740214-B1 | Photosensitive composition and photosensitive rubber plate | ZEON CORP (JP) | 2002-07-10 | — | — | EP | disclosed |
| WO-2002023273-A2 | PHOTOSENSITIVE COMPOSITION, CURED ARTICLE THEREOF, AND PRINTED CIRCUIT BOARD USING THE SAME | SHOWA DENKO K.K. (JP) | 2002-03-21 | — | — | WO | disclosed |
| US-5863704-A | BLENDS OF DIENE-AROMATIC VINYL COPOLYMER BLOCKS, PHOTOPOLYMERIZABLE ETHYLENICALLY UNSATURATED MONOMER AND PHOTOINITIATOR | NIPPON ZEON COMPANY, LTD. (JP) | 1999-01-26 | — | — | US | disclosed |
| EP-0546814-B1 | A polyimide photosensitive cover coating agent | CHISSO CORP (JP) | 1997-09-17 | — | — | EP | disclosed |
| EP-0740214-A2 | Photosensitive composition and photosensitive rubber plate | NIPPON ZEON CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0410702-B1 | Printing ink composition | CHISSO CORP (JP) | 1996-04-10 | — | — | EP | disclosed |
| US-5326792-A | Protective coatings for flexibile circuits | CHISSO CORPORATION (JP) | 1994-07-05 | — | — | US | disclosed |
| US-5254361-A | Improved adhesion, flexibility, and heat resistance, mixture of solvent, polyamide-acid, and partially imidized polyamide-acid, heating to dry and cure | CHISSO CORPORATION (JP) | 1993-10-19 | — | — | US | disclosed |
| EP-0546814-A1 | A polyimide photosensitive cover coating agent | CHISSO CORPORATION (JP) | 1993-06-16 | — | — | EP | disclosed |
| EP-0410702-A2 | Printing ink composition | Chisso Corporation (JP) | 1991-01-30 | — | — | EP | disclosed |
| JP-S5453145-A | RESIN COMPOSITION FOR COATING | HITACHI CHEM CO LTD | 1979-04-26 | — | — | JP | disclosed |