Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Acrylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FGFR4 known ✓ | P22455 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.67 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 6/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.33 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.33 |
| ▸ | PEPD | P12955 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | AKT1 | P31749 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL28474981 | 1.00 | LMNA (0.67) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL11608855 | 0.97 | LMNA (0.71) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL27662764 | 0.97 | LMNA (0.71) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL4910395 | 0.97 | LMNA (0.71) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL56636 | 0.97 | LMNA (0.71) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL10783300 | 0.97 | LMNA (0.71) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL29183487 | 0.93 | LMNA (0.67) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL28745664 | 0.93 | LMNA (0.67) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL22418781 | 0.93 | LMNA (0.67) | LMNAALOX15HSD17B10TSHRALDH1A1 | |
| Acrylic Acid SCHEMBL28145064 | 0.93 | LMNA (0.67) | LMNAALOX15HSD17B10TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-54053145-A | — | — | None | — | — | JP | disclosed |
| EP-4394509-A1 | PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC PLATE | Zeon Corporation (JP) | 2024-07-03 | — | — | EP | disclosed |
| CN-117813552-A | Photosensitive composition for pattern formation and flexographic plate | 日本瑞翁株式会社 | 2024-04-02 | — | — | CN | disclosed |
| WO-2023026928-A1 | PHOTOSENSITIVE COMPOSITION FOR PATTERN FORMATION, AND FLEXOGRAPHIC PLATE | 日本ゼオン株式会社 | 2023-03-02 | — | — | WO | disclosed |
| CN-107111235-B | Protective film for dry film resist and photosensitive resin laminate | 三菱化学株式会社 | 2020-11-10 | — | — | CN | disclosed |
| EP-3478755-A1 | PHOSPHONATE MODIFIED METAL OXIDE PARTICLE | Dow Global Technologies, LLC (US) | 2019-05-08 | — | — | EP | disclosed |
| WO-2018000295-A1 | PHOSPHONATE MODIFIED METAL OXIDE PARTICLE | DOW GLOBAL TECHNOLOGIES LLC (US) | 2018-01-04 | — | — | WO | disclosed |
| US-6818382-B2 | PHOTOCURABLE URETHANE (METH)ACRYLATE COMPOUND HAVING A CARBOXYL GROUP, A THERMOSETTING RESIN, PHOTOPOLYMERIZATION INITIATOR AND A THERMO POLYMERIZATION CATALYST | SHOWA DENKO K.K. (JP) | 2004-11-16 | — | — | US | disclosed |
| EP-1317691-A2 | PHOTOSENSITIVE COMPOSITION, CURED ARTICLE THEREOF, AND PRINTED CIRCUIT BOARD USING THE SAME | Showa Denko K.K. (JP) | 2003-06-11 | — | — | EP | disclosed |
| US-20030003398-A1 | Photosensitive composition, cured article thereof, and printed circuit board using the same | SHOWA DENKO K.K. (JP) | 2003-01-02 | — | — | US | disclosed |
| EP-0740214-A2 | Photosensitive composition and photosensitive rubber plate | NIPPON ZEON CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0515861-B1 | Ink composition for printing | CHISSO CORP (JP) | 1996-07-17 | — | — | EP | disclosed |
| EP-0410702-B1 | Printing ink composition | CHISSO CORP (JP) | 1996-04-10 | — | — | EP | disclosed |
| US-5380806-A | For flexible printed circuit board | CHISSO CORPORATION (JP) | 1995-01-10 | — | — | US | disclosed |
| US-5326792-A | Protective coatings for flexibile circuits | CHISSO CORPORATION (JP) | 1994-07-05 | — | — | US | disclosed |
| US-5254361-A | Improved adhesion, flexibility, and heat resistance, mixture of solvent, polyamide-acid, and partially imidized polyamide-acid, heating to dry and cure | CHISSO CORPORATION (JP) | 1993-10-19 | — | — | US | disclosed |
| EP-0546814-A1 | A polyimide photosensitive cover coating agent | CHISSO CORPORATION (JP) | 1993-06-16 | — | — | EP | disclosed |
| EP-0515861-A2 | Ink composition for printing | CHISSO CORPORATION (JP) | 1992-12-02 | — | — | EP | disclosed |
| EP-0410702-A2 | Printing ink composition | Chisso Corporation (JP) | 1991-01-30 | — | — | EP | disclosed |
| JP-S5453145-A | RESIN COMPOSITION FOR COATING | HITACHI CHEM CO LTD | 1979-04-26 | — | — | JP | disclosed |