SCHEMBL6890463

SCHEMBL6890463

CO[Si](C)(OC)c1ccc(O)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 5/20 0.48
ESR2 Q92731 4/20 0.48
CA12 O43570 2/20 0.43
CA1 P00915 2/20 0.43
CA2 P00918 2/20 0.43
CA9 Q16790 2/20 0.43
CA14 Q9ULX7 2/20 0.43
CA7 P43166 1/20 0.43
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
KDM4E B2RXH2 1/20 0.40
NPC1 O15118 1/20 0.40
GMNN O75496 1/20 0.40
ALDH1A1 P00352 1/20 0.40
LMNA P02545 1/20 0.40
CA3 P07451 1/20 0.40
CYP3A4 P08684 1/20 0.40
MAPT P10636 1/20 0.40
TYR P14679 1/20 0.40
HPGD P15428 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL397346 0.87 CA12 (0.30) CA12CA1CA2CA9CA14
SCHEMBL19809452 0.83 ESR1 (0.45) ESR1ESR2CA12CA1CA2
SCHEMBL6436993 0.79 ESR2 (0.32) ESR2KDM4E
SCHEMBL5421307 0.79
SCHEMBL5421236 0.79
SCHEMBL5421459 0.77
SCHEMBL758781 0.77 ESR1 (0.46) ESR1ESR2CA12CA1CA2
SCHEMBL16062866 0.77
SCHEMBL19809445 0.77 ESR1 (0.46) ESR1ESR2CA12CA1CA2
SCHEMBL384790 0.77 ACHE (0.42) CA1CA2CA9CA7MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040259094-A1 Method of attachment of a biomolecule to a solid surface GE HEALTHCARE UK LIMITED (GB) 2004-12-23 US claimed
EP-1459067-A2 METHOD OF ATTACHMENT OF A BIOMOLECULE TO A SOLID SURFACE Amersham Biosciences UK Limited (GB) 2004-09-22 EP claimed
WO-2003027677-A2 METHOD OF ATTACHMENT OF A BIOMOLECULE TO A SOLID SURFACE AMERSHAM BIOSCIENCES UK LIMITED (GB) 2003-04-03 WO claimed
US-11912889-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2024-02-27 US disclosed
US-20230257503-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE MITSUBISHI CHEMICAL CORPORATION (JP) 2023-08-17 US disclosed
EP-4212256-A1 RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE Mitsubishi Chemical Corporation (JP) 2023-07-19 EP disclosed
US-11542397-B2 Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-03 US disclosed
US-11413682-B2 Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid TOKYO OHKA KOGYO CO., LTD. (JP) 2022-08-16 US disclosed
US-20220220338-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2022-07-14 US disclosed
US-20220213348-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER TOKYO OHKA KOGYO CO., LTD. (JP) 2022-07-07 US disclosed
US-11377522-B2 Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer TOKYO OHKA KOGYO CO., LTD. (JP) 2022-07-05 US disclosed
CN-101324755-B Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof JSR CORP 2012-10-03 CN disclosed
CN-101515113-B Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same JSR CORP 2012-07-18 CN disclosed
CN-101639628-A Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element JSR CORP JP 2010-02-03 CN disclosed
CN-101515113-A Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same JSR CORP (JP) 2009-08-26 CN disclosed
CN-101324755-A Radiation sensitive resin composition, interlayer dielectric and microlens, and method for producing thereof JSR CORP (JP) 2008-12-17 CN disclosed
US-7217493-B2 acid-decomposable group-containing polysiloxane or polysilsesquioxane and a specific amount of an acid generator that generates a sulfonic acid, and an organic base; high sensitivity, high resolution and good line edge roughness FUJIFILM CORPORATION (JP) 2007-05-15 US disclosed
US-20040259094-A1 Method of attachment of a biomolecule to a solid surface GE HEALTHCARE UK LIMITED (GB) 2004-12-23 US disclosed
EP-1459067-A2 METHOD OF ATTACHMENT OF A BIOMOLECULE TO A SOLID SURFACE Amersham Biosciences UK Limited (GB) 2004-09-22 EP disclosed
WO-2003027677-A2 METHOD OF ATTACHMENT OF A BIOMOLECULE TO A SOLID SURFACE AMERSHAM BIOSCIENCES UK LIMITED (GB) 2003-04-03 WO disclosed