SCHEMBL397346

SCHEMBL397346

CO[Si](C)(OC)c1ccc([Si](C)(OC)OC)cc1

nearest known ligand 0.30

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA7 P43166 1/20 0.30
CA9 Q16790 1/20 0.30
CA14 Q9ULX7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6436993 0.91 ESR2 (0.32)
SCHEMBL5421236 0.91
SCHEMBL5421307 0.91
SCHEMBL5421459 0.89
SCHEMBL16062866 0.89
SCHEMBL384790 0.89 ACHE (0.42) CA1CA2CA7CA9
SCHEMBL6434075 0.87 APP (0.32)
SCHEMBL22551454 0.87 IDO1 (0.32)
SCHEMBL6890463 0.87 ESR1 (0.48) CA12CA1CA2CA7CA9
SCHEMBL6433976 0.87 CYP2A6 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230114933-A1 GRAPHENE INTERCONNECT STRUCTURE, ELECTRONIC DEVICE INCLUDING GRAPHENE INTERCONNECT STRUCTURE, AND METHOD OF PREPARING GRAPHENE INTERCONNECT STRUCTURE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-04-13 US claimed
EP-3340253-A1 UV-RESISTANT ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
EP-3340252-A1 ELECTRODE ASSEMBLY Solvay SA (BE) 2018-06-27 EP claimed
US-20090181178-A1 SiCOH DIELECTRIC MATERIAL WITH IMPROVED TOUGHNESS AND IMPROVED Si-C BONDING, SEMICONDUCTOR DEVICE CONTAINING THE SAME, AND METHOD TO MAKE THE SAME INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-16 US claimed
US-20080265381-A1 SiCOH DIELECTRIC INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-10-30 US claimed
US-7381659-B2 Method for reducing film stress for SiCOH low-k dielectric materials INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-06-03 US claimed
US-20070173071-A1 SiCOH dielectric INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-07-26 US claimed
US-20070117408-A1 METHOD FOR REDUCING FILM STRESS FOR SICOH LOW-K DIELECTRIC MATERIALS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-05-24 US claimed
US-20060165891-A1 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-07-27 US claimed
US-20050194619-A1 SiCOH dielectric material with improved toughness and improved Si-C bonding, semiconductor device containing the same, and method to make the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2005-09-08 US claimed
EP-4683005-A1 ELECTRODE CATALYST CONTAINING POROUS SILICON CARBIDE COMPOSITE MATERIAL, ELECTRODE FOR ELECTRODE CATALYST, FUEL CELL, AND MANUFACTURING METHOD OF ELECTRODE CATALYST DIC Corporation (JP) 2026-01-21 EP disclosed
EP-4683006-A1 POROUS SILICON CARBIDE COMPOSITE MATERIAL, ELECTRODE FOR FUEL CELL, AND METHOD FOR MANUFACTURING POROUS SILICON CARBIDE COMPOSITE MATERIAL DIC Corporation (JP) 2026-01-21 EP disclosed
US-12473405-B2 Polyorganosiloxane, polyorganosiloxane composition, cured product, polyorganosiloxane-containing electrolytic solution for electrolytic capacitor, and electrolytic capacitor using same MITSUBISHI CHEMICAL CORPORATION (JP) 2025-11-18 US disclosed
US-20250239627-A1 ELECTRODE CATALYST CONTAINING POROUS SILICON OXYCARBIDE COMPOSITE MATERIAL, ELECTRODE, FUEL CELL, AND METHOD FOR PRODUCING ELECTRODE CATALYST CONTAINING POROUS SILICON OXYCARBIDE COMPOSITE MATERIAL DIC CORPORATION (JP) 2025-07-24 US disclosed
WO-2025126962-A1 PLATINUM CATALYST CONTAINING POROUS SILICON CARBIDE COMPOSITE MATERIAL, CATALYTIC ELECTRODE, FUEL CELL, AND METHOD FOR PRODUCING SAID PLATINUM CATALYST DIC株式会社 2025-06-19 WO disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed
EP-1334993-A2 Proton conducting membrane, method for producing the same, and fuel cell using the same National Institute of Advanced Industrial Science and Technology (JP) 2003-08-13 EP disclosed
US-20030130389-A1 Curable silicone resin composition and reactive silicon compounds DOW CORNING LIMITED (GB) 2003-07-10 US disclosed
EP-1276807-A1 CURABLE SILICONE RESIN COMPOSITION AND REACTIVE SILICON COMPOUNDS Dow Corning Corporation (US) 2003-01-22 EP disclosed
WO-2001083608-A1 CURABLE SILICONE RESIN COMPOSITION AND REACTIVE SILICON COMPOUNDS DOW CORNING CORPORATION (US) 2001-11-08 WO disclosed