⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL27930931 | 0.97 | TSHR (0.39) | — | |
| SCHEMBL6895529 | 0.92 | TSHR (0.42) | — | |
| SCHEMBL27285153 | 0.89 | TSHR (0.46) | — | |
| SCHEMBL6896851 | 0.89 | TSHR (0.46) | — | |
| SCHEMBL4526824 | 0.89 | TSHR (0.46) | — | |
| SCHEMBL5881449 | 0.81 | — | — | |
| SCHEMBL5968696 | 0.77 | TSHR (0.41) | — | |
| SCHEMBL8770081 | 0.74 | — | — | |
| SCHEMBL17418151 | 0.72 | ALDH1A1 (0.33) | — | |
| SCHEMBL2268135 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4693927-A | MULTILAYER PROTECTIVE FILM FORMED BY PLASMA POLYMERIZATION COVERING THIN MAGNETIC METAL FILM ON SUPPORT; SCRATCH, WEATHER AND ABRASION RESISTANT | FUJI PHOTO FILM COMPANY LIMITED (JP) | 1987-09-15 | — | — | US | claimed |
| JP-7188255-A | — | — | None | — | — | JP | disclosed |
| CN-102906865-A | Low dielectric constant interlayer insulating film and method for forming low dielectric constant interlayer insulating film | TAIYO NIPPON SANSO CORP | 2013-01-30 | — | — | CN | disclosed |
| CN-101925690-B | Insulating film material, film forming method using the insulating film material, and insulating film | NAT INST FOR MATERIALS SCIENCE | 2012-11-07 | — | — | CN | disclosed |
| CN-102308020-A | Insulating film material, and film formation method utilizing the material, and insulating film | NAT INST FOR MATERIAL SCIENCE | 2012-01-04 | — | — | CN | disclosed |
| CN-102138205-A | Insulating film material, film forming method using the insulating film material, and insulating film | NAT INST FOR MATERIALS SCIENCE | 2011-07-27 | — | — | CN | disclosed |
| CN-101925690-A | Insulating film material, film forming method using the insulating film material, and insulating film | NAT INST FOR MATERIALS SCIENCE | 2010-12-22 | — | — | CN | disclosed |
| CN-1837221-A | Production processes for triorganomonochlorosilanes | HOKKO CHEM IND CO (JP) | 2006-09-27 | — | — | CN | disclosed |
| CN-1612886-A | Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes | HOKKO CHEM IND CO (JP) | 2005-05-04 | — | — | CN | disclosed |
| EP-1098926-B1 | CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME | BAYER MATERIALSCIENCE AG (DE) | 2004-03-03 | — | — | EP | disclosed |
| EP-1098926-A1 | CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME | Bayer Aktiengesellschaft (DE) | 2001-05-16 | — | — | EP | disclosed |
| WO-2000002954-A1 | CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME | BAYER AKTIENGESELLSCHAFT (DE) | 2000-01-20 | — | — | WO | disclosed |
| JP-H07188255-A | POLY(SILASPIRO)COMPOUND, NONLINEAR OPTICAL MATERIAL AND TRANSPARENT OPTICAL MATERIAL | MANAC INC | 1995-07-25 | — | — | JP | disclosed |
| US-4693927-A | MULTILAYER PROTECTIVE FILM FORMED BY PLASMA POLYMERIZATION COVERING THIN MAGNETIC METAL FILM ON SUPPORT; SCRATCH, WEATHER AND ABRASION RESISTANT | FUJI PHOTO FILM COMPANY LIMITED (JP) | 1987-09-15 | — | — | US | disclosed |