SCHEMBL6893811

SCHEMBL6893811

CCOc1cccc2oc3ccccc3c(=O)c12

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 6/20 0.69
CYP2A6 P11509 1/20 0.59
MAPT P10636 3/20 0.52
TP53 P04637 1/20 0.52
RXFP1 Q9HBX9 1/20 0.52
KDM4E B2RXH2 3/20 0.52
ALDH1A1 P00352 2/20 0.52
HPGD P15428 2/20 0.52
GLA P06280 1/20 0.52
CYP3A4 P08684 1/20 0.52
PGAM1 P18669 1/20 0.52
CASP1 P29466 1/20 0.52
CASP7 P55210 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
HSD17B10 Q99714 1/20 0.52
MEN1 O00255 2/20 0.51
KMT2A Q03164 2/20 0.51
NPC1 O15118 2/20 0.51
LMNA P02545 2/20 0.51
PABPC1 P11940 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13990695 0.87 CYP2A6 (0.57) MAOACYP2A6MAPTTP53RXFP1
SCHEMBL28198664 0.85 MAOA (0.62) MAOACYP2A6MAPTKDM4EALDH1A1
SCHEMBL27823076 0.85 MAOA (0.70) MAOAMAPTKDM4EALDH1A1HPGD
SCHEMBL644478 0.84 MAOA (0.52) MAOACYP2A6MAPTTP53RXFP1
SCHEMBL29287875 0.84 MAOA (0.52) MAOACYP2A6MAPTTP53RXFP1
SCHEMBL29833663 0.84 MAOA (0.52) MAOACYP2A6MAPTTP53RXFP1
SCHEMBL5748445 0.82 MAOA (0.58) MAOACYP2A6MAPTKDM4EALDH1A1
SCHEMBL5749598 0.82 MAOA (0.58) MAOACYP2A6MAPTKDM4EALDH1A1
SCHEMBL640746 0.82 MAOA (1.00) MAOACYP2A6MAPTKDM4EALDH1A1
SCHEMBL4914778 0.82 MAOA (0.61) MAOAMAPTKDM4EALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190134596-A1 PLASMONIC ASSISTED SYSTEMS AND METHODS FOR INTERIOR ENERGY-ACTIVATION FROM AN EXTERIOR SOURCE Tencent America LLC (US) 2019-05-09 US disclosed
EP-1291335-B1 Radiation curable precious metal composition, decalcomanias containing it and method of decorating FERRO GMBH (DE) 2004-08-11 EP disclosed
CN-1145834-C Panel for liquid crystal display and manufacturing method thereof �Ҵ���˾ 2004-04-14 CN disclosed
WO-2003022781-A1 RADIATION CURABLE PRECIOUS METAL PREPARATION, TRANSFERS CONTAINING SAME AND METHOD FOR DECORATION FERRO GMBH (DE) 2003-03-20 WO disclosed
EP-1291335-A1 Radiation curable precious metal composition, decalcomanias containing it and method of decorating OMG AG & Co. KG (DE) 2003-03-12 EP disclosed
CN-1330283-A Panel for liquid crystal display and manufacturing method thereof IBM (US) 2002-01-09 CN disclosed
EP-0397742-A4 POROUS ARTICLE IMPREGNATION RESIN COMPOSITION, AND SYSTEM FOR TREATING IMPREGNATION PROCESS WASTE WATER 1991-07-03 EP disclosed
EP-0397742-A1 POROUS ARTICLE IMPREGNATION RESIN COMPOSITION, AND SYSTEM FOR TREATING IMPREGNATION PROCESS WASTE WATER. LOCTITE CORP (US) 1990-11-22 EP disclosed
WO-1989006245-A1 POROUS ARTICLE IMPREGNATION RESIN COMPOSITION, AND SYSTEM FOR TREATING IMPREGNATION PROCESS WASTE WATER LOCTITE CORPORATION (US) 1989-07-13 WO disclosed