SCHEMBL6894712

SCHEMBL6894712

C=CC[SiH](CC=C)CCCC

nearest known ligand 0.43

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.43
ALDH1A1 P00352 2/20 0.43
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL27912823 0.97 TSHR (0.42) TSHRALDH1A1
SCHEMBL5968559 0.95 TSHR (0.43) TSHRALDH1A1LMNA
SCHEMBL437976 0.92 TSHR (0.44) TSHRALDH1A1LMNA
SCHEMBL6897883 0.90 TSHR (0.48) TSHRALDH1A1LMNA
SCHEMBL438729 0.87 TSHR (0.44) TSHRALDH1A1LMNA
SCHEMBL5881430 0.83 TSHR (0.38) TSHRALDH1A1
SCHEMBL8770263 0.83 TSHR (0.41) TSHRALDH1A1
SCHEMBL5881347 0.78 TSHR (0.38) TSHRALDH1A1
SCHEMBL8769540 0.77
SCHEMBL26666759 0.77 TSHR (0.62) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102906865-A Low dielectric constant interlayer insulating film and method for forming low dielectric constant interlayer insulating film TAIYO NIPPON SANSO CORP 2013-01-30 CN disclosed
CN-101925690-B Insulating film material, film forming method using the insulating film material, and insulating film NAT INST FOR MATERIALS SCIENCE 2012-11-07 CN disclosed
CN-102308020-A Insulating film material, and film formation method utilizing the material, and insulating film NAT INST FOR MATERIAL SCIENCE 2012-01-04 CN disclosed
CN-101925690-A Insulating film material, film forming method using the insulating film material, and insulating film NAT INST FOR MATERIALS SCIENCE 2010-12-22 CN disclosed
EP-1098926-B1 CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME BAYER MATERIALSCIENCE AG (DE) 2004-03-03 EP disclosed
EP-1098926-A1 CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME Bayer Aktiengesellschaft (DE) 2001-05-16 EP disclosed
WO-2000002954-A1 CROSS-LINKABLE HYPERBRANCHED POLYMERS, METHOD FOR THE PRODUCTION AND USE OF THE SAME BAYER AKTIENGESELLSCHAFT (DE) 2000-01-20 WO disclosed