SCHEMBL6902971

SCHEMBL6902971

O=C1c2ccccc2Cc2ccc(-c3ccccc3)cc21

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 3/20 0.64
▸ L3MBTL1 Q9Y468 2/20 0.55
▸ MEN1 O00255 1/20 0.55
▸ APAF1 O14727 1/20 0.55
▸ NPC1 O15118 1/20 0.55
▸ LMNA P02545 1/20 0.55
▸ MAPT P10636 1/20 0.55
▸ THRB P10828 1/20 0.55
▸ XBP1 P17861 1/20 0.55
▸ PTBP1 P26599 1/20 0.55
▸ HTT P42858 1/20 0.55
▸ RAB9A P51151 1/20 0.55
▸ GALK1 P51570 1/20 0.55
▸ BLM P54132 1/20 0.55
▸ SMAD3 P84022 1/20 0.55
▸ KMT2A Q03164 1/20 0.55
▸ ATM Q13315 1/20 0.55
▸ SMN1; SMN2 Q16637 1/20 0.55
▸ NPSR1 Q6W5P4 1/20 0.55
▸ TYRO3 Q06418 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28201195 0.93 TDP2 (0.58) MAOAL3MBTL1MEN1APAF1NPC1
SCHEMBL1527421 0.93 MAOA (0.64) MAOAL3MBTL1MEN1APAF1NPC1
SCHEMBL10057548 0.91 TYRO3 (0.53) MAOAL3MBTL1MEN1APAF1NPC1
Anthrone SCHEMBL27997415 0.89 MAOA (0.82) MAOAL3MBTL1MEN1APAF1NPC1
SCHEMBL10045662 0.86 TDP2 (0.49) MAOAL3MBTL1MEN1APAF1NPC1
SCHEMBL27694768 0.86 MAOA (0.64) MAOAL3MBTL1MEN1NPC1LMNA
SCHEMBL27614921 0.85 NPC1 (0.52) MAOAL3MBTL1MEN1APAF1NPC1
SCHEMBL27874725 0.85 MAOA (0.58) MAOAL3MBTL1MEN1APAF1NPC1
SCHEMBL5021694 0.85 MAOA (0.82) MAOAL3MBTL1MEN1NPC1LMNA
SCHEMBL18798556 0.84 MAOA (0.53) MAOAL3MBTL1MEN1APAF1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101400719-B Phenoxy resin for optical material, resin composition for optical material, resin film for optical material, and optical waveguide using those HITACHI CHEMICAL CO LTD 2013-01-23 — — CN disclosed
CN-101356452-B Resin composition for optical material, resin film for optical material, and optical waveguide HITACHI CHEMICAL CO LTD 2011-09-21 — — CN disclosed
CN-101002142-B Photosensitive resin composition and photosensitive film made with the same HITACHI CHEMICAL CO LTD 2010-12-15 — — CN disclosed
CN-101400719-A Phenoxy resin for optical material, resin composition for optical material, resin film for optical material, and optical waveguide using those HITACHI CHEMICAL CO LTD (JP) 2009-04-01 — — CN disclosed
CN-101356452-A Resin composition for optical material, resin film for optical material, and optical waveguide HITACHI CHEMICAL CO LTD (JP) 2009-01-28 — — CN disclosed
CN-101002142-A Photosensitive resin composition and photosensitive film made with the same HITACHI CHEMICAL CO LTD (JP) 2007-07-18 — — CN disclosed
US-6815481-B2 FUSED DIBENZO THERMAL STABILIZERS SUCH AS ANTHRACENE, XANTHENE AND ANTHRONE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-09 — — US disclosed
US-20020032256-A1 Polybutadiene composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-03-14 — — US disclosed
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