⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6907152 | 0.89 | — | — | |
| SCHEMBL6904064 | 0.86 | LMNA (0.33) | — | |
| SCHEMBL6899741 | 0.84 | — | — | |
| SCHEMBL6897163 | 0.84 | CNR2 (0.31) | — | |
| SCHEMBL6905648 | 0.83 | LMNA (0.31) | — | |
| SCHEMBL6904248 | 0.83 | LMNA (0.34) | — | |
| SCHEMBL6905852 | 0.83 | LMNA (0.32) | — | |
| SCHEMBL6899167 | 0.80 | EDNRB (0.31) | — | |
| SCHEMBL5083099 | 0.79 | — | — | |
| SCHEMBL6905136 | 0.78 | POLB (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1473323-A1 | Polyethylene composition and process for producing same | Tosoh Corporation (JP) | 2004-11-03 | — | — | EP | disclosed |
| US-6716892-B1 | PRINTED CIRCUIT BOARD; WATER SOLUBILITY; ACRYLATED POLYESTER URETHANE AND AN ACRYLATED EPOXY RESIN | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2004-04-06 | — | — | US | disclosed |
| EP-1170315-A1 | URETHANE OLIGOMER, RESIN COMPOSITIONS THEREOF, AND CURED ARTICLE THEREOF | Nippon Kayaku Kabushiki Kaisha (JP) | 2002-01-09 | — | — | EP | disclosed |
| EP-0077593-B1 | PHOTOSENSITIVE MATERIAL FOR ELECTROPHOTOGRAPHY | MITA INDUSTRIAL CO. LTD. (JP) | 1988-01-20 | — | — | EP | disclosed |
| EP-0077593-A2 | Photosensitive material for electrophotography | MITA INDUSTRIAL CO. LTD. (JP) | 1983-04-27 | — | — | EP | disclosed |