SCHEMBL6906453

SCHEMBL6906453

CONc1nc(NOC)nc(N(C)OC)n1

nearest known ligand 0.35

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.35
KCNH3 Q9ULD8 1/20 0.34
GAA P10253 3/20 0.31
ALDH1A1 P00352 2/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C19 P33261 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
POLB P06746 1/20 0.31
KDM4E B2RXH2 1/20 0.31
KMT2A Q03164 1/20 0.31
PDE4A P27815 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL196708 0.88 TP53 (0.35) TP53POLB
SCHEMBL61878 0.82 TP53 (0.35) TP53GAAPOLB
SCHEMBL9105166 0.80 LMNA (0.37) TP53GAAALDH1A1CYP1A2CYP2C19
SCHEMBL29629326 0.78 KCNH3 (0.44) KCNH3ALDH1A1CYP1A2KDM4EKMT2A
SCHEMBL27687978 0.76 POLB (0.32) KCNH3POLB
SCHEMBL4063280 0.75 TP53 (0.48) TP53ALDH1A1CYP1A2
SCHEMBL9107344 0.75 CYP1A2 (0.60) GAAALDH1A1CYP1A2CYP2C19L3MBTL1
Ena-001 SCHEMBL9105353 0.72 CYP1A2 (0.51) TP53GAACYP1A2CYP2C19L3MBTL1
SCHEMBL9912524 0.72 PDE4A (0.38) TP53ALDH1A1CYP2C19PDE4A
Hydrochloric Acid SCHEMBL9281939 0.71 PDE4A (0.37) TP53ALDH1A1CYP2C19PDE4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0604922-B1 Durable compositions and use of same CYTEC TECH CORP (US) 2004-11-17 EP claimed
US-5593735-A Aminoresin based coatings containing 1,3,5-triazine tris-carbamate co-crosslinkers CYTEC TECHNOLOGY CORP. (US) 1997-01-14 US claimed
US-5574103-A ETCH RESISTANCE, NO FORMALDEHYDE CYTEC TECHNOLOGY CORP. (US) 1996-11-12 US claimed
EP-0604922-A1 Durable compositions and use of same CYTEC TECHNOLOGY CORP. (US) 1994-07-06 EP claimed
US-11169440-B2 Radiation-sensitive resin composition and electronic component ZEON CORPORATION (JP) 2021-11-09 US disclosed
EP-3345970-B1 RESIN COMPOSITION ZEON CORP (JP) 2021-07-28 EP disclosed
EP-3121651-B1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT ZEON CORP (JP) 2019-05-15 EP disclosed
EP-3438746-A1 RADIATION SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT Zeon Corporation (JP) 2019-02-06 EP disclosed
US-10025182-B2 Radiation-sensitive resin composition and electronic device ZEON CORPORATION (JP) 2018-07-17 US disclosed
EP-3345970-A1 RESIN COMPOSITION Zeon Corporation (JP) 2018-07-11 EP disclosed
EP-3345971-A1 RESIN COMPOSITION Zeon Corporation (JP) 2018-07-11 EP disclosed
US-20170023859-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC DEVICE ZEON CORPORATION (JP) 2017-01-26 US disclosed
EP-3121651-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND ELECTRONIC COMPONENT Zeon Corporation (JP) 2017-01-25 EP disclosed